"cerium oxide polishing compound"
MRR CeO2 الزجاج الأمامي مسحوق التلميع للأراضي النادرة لصنع الدوائر المتكاملة
Polishing Powder for Integrated Circuit Fabrication Description Enable the next generation of semiconductor performance with ourSeries Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for Chemical Mechanical Planarization (CMP) within IC fabrication, our powders are optimized for nodes...
2.2μM Ph محايدة البوليسة CMP سمك للأسطوانات الزجاجية
CMP Slurry For Glass Wafer Substrates Description Lichen CMP Slurry for Glass Wafer Substrates is a high-purity, ready-to-use polishing slurry formulated for precision chemical-mechanical planarization (CMP) of glass wafer substrates. Designed for the advanced semiconductor, photonics, and ...
أوفم البوليسينغ Ceo2 مسحوق للزجاج الأمامي للسيارات Cas 1306-38-3
Polishing Powder For Automotive Glass And Windshields Description Lichen Cerium Oxide Polishing Powder for Automotive Glass and Windshields is a high-purity, fine-grade polishing material designed to deliver superior results in the automotive glass industry. Engineered for precision finishing, this ...
ملاط نانو سيريا عالي النقاء لعمليات CMP (حجم جسيمات 200 نانومتر) مصمم لأشباه الموصلات
High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next...
