Quality Polishing CMP Optical Glass Slurry CeO2 Powder For LCD Display factory
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Quality Polishing CMP Optical Glass Slurry CeO2 Powder For LCD Display factory
Quality Polishing CMP Optical Glass Slurry CeO2 Powder For LCD Display factory
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Polishing CMP Optical Glass Slurry CeO2 Powder For LCD Display

Brand Name: LICHEN
Model Number: LC013S05
Place of Origin: CHINA
Certification: ISO
Minimum Order Quantity: 20KGS
Price: NEGOCIABLE
Supply Ability: 3000MT/YEAR

Product Details


Particle Size: 0.4-0.6 CAS No.: 1306-38-3
CeO₂: 63~68% Suspension Rate: High
PH Range: 7-10 Application: LCD Display
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CMP glass slurry

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CeO2 glass slurry

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CeO2 cmp slurry

Product Description

 

Polishing Slurry for LCD Display Manufacturing

Description

Lichen Polishing Powder for Optical Glass Manufacturing is a premium-grade optical polishing material engineered to deliver consistent material removal, excellent surface smoothness, and stable process performance across a wide range of optical glass types. Formulated using high-purity abrasives with controlled particle size distribution, this polishing powder supports the demanding requirements of precision optics production.

Designed for both intermediate and final polishing stages, the product enables manufacturers to achieve high optical clarity, low surface roughness, and repeatable surface quality in high-volume and high-precision optical glass manufacturing environments.

 

Key Features & Advantages

High-Purity Abrasive Materials

Low impurity content ensures clean polishing behavior and optical-grade surface quality.

Controlled Particle Size Distribution

Provides uniform material removal and minimizes micro-scratches and surface defects.

Stable Polishing Performance

Consistent abrasive characteristics support repeatable results across production batches.

Versatile Application Range

Suitable for a wide variety of optical glass compositions and polishing processes.

Process & Equipment Compatibility

Designed for use with standard optical polishing machines, pads, and tooling.

 

Tech Data

Molecular Formula CAS No. CeO₂ %  D50 (μm) Appearance Application
CeO2 1306-38-3 63~68% 0.4-0.6μm White Slurry LCD Display 

 

Particle Size Distribution

 

Polishing CMP Optical Glass Slurry CeO2 Powder For LCD Display 0

Q&A

1. What is rare earth polishing powder?

Rare earth polishing powder is a high-purity compound used for polishing optical components, semiconductor wafers, and delicate surfaces like glass and lenses. It delivers a smooth, high-clarity finish without damaging the material.

2. How do I choose the right rare earth polishing powder for my application?

To select the ideal polishing powder, consider factors like the material you’re polishing, the required finish, and specifications like particle size and purity. Our sales team is available to help you choose the perfect product for your needs.

3. How should I store  rare earth polishing powder?

Store in a cool, dry place, away from moisture and direct sunlight. Keep the powder in airtight containers to prevent contamination and maintain its effectiveness. With proper storage, it typically lasts 1-2 years.

4. Do you provide customized rare earth formulations?

Yes, we offer custom rare earth polishing powders and slurries, tailored to meet your specific needs, including adjustments to particle size, chemical composition, or slurry consistency.

5. Can I get a sample before making a bulk order?

Absolutely! We provide samples for evaluation. Contact our team to request a sample, and we’ll arrange the shipment.

6. How can I place an order? What is the typical delivery time?

To place an order, simply contact our sales team, who will guide you through the process and provide a quote. Delivery times vary based on order size, location, and stock availability, and we’ll give you an estimated schedule once the order is confirmed.

Product Highlights

Polishing Slurry for LCD Display Manufacturing Description Lichen Polishing Powder for Optical Glass Manufacturing is a premium-grade optical polishing material engineered to deliver consistent material removal, excellent surface smoothness, and stable process performance across a wide range of ...

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