"powder rare earth product"
جودة عالية لمواد الأرض النادرة لانتانوم سيريم هيدروكسيد
Lanthanum-Cerium Hydroxide Molecular Formula: LaCeₙ(OH)ₓ Appearance: White powder Uses: Used as a refining and decolorizing agent in the glass industry, and as a raw material for the production of high-cerium compounds. Item Specifications Test Method Item LaCe n (OH) X -65CeA LaCe n (OH) X -65CeB TREO(wt%) ≥60 ≥60 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La 2 O 3 /TREO 35±2 35±2 GB/T 16484.3 CeO 2 /TREO 65±2 65±2 Pr 6 O 11 /TREO ≤0.01 ≤0.005 Nd 2 O 3
MRR CeO2 الزجاج الأمامي مسحوق التلميع للأراضي النادرة لصنع الدوائر المتكاملة
Polishing Powder for Integrated Circuit Fabrication Description Enable the next generation of semiconductor performance with ourSeries Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for Chemical Mechanical Planarization (CMP) within IC fabrication, our powders are optimized for nodes. The complexity of multi-layer interconnects and vertical scaling demands unprecedented surface planarity. Our high-activity ceria powders provide the atomic-level smoothness and
زجاج السيارات الخالي من الخدوش مسحوق التلميع للأراضي النادرة للنهاية الواضحة
Automotive Glass Polishing Powder For Clear FinishingDescriptionLichen Automotive Glass Polishing Powder for Clear Finishing is a premium cerium oxide-based polishing powder specifically formulated to deliver crystal-clear finishes on automotive glass surfaces. Designed for windshields, side windows, mirrors, and headlight lenses, this polishing powder ensures high optical clarity while removing surface imperfections such as scratches, haze, and water spots.Ideal for both OEM
CeO2 سيريوم غبار التلميع للأراضي النادرة لألواح العرض LCD OLED
Polishing Powder for High-Resolution Display Panels Description Deliver the extreme clarity and pixel-perfect surfaces required for markets with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for high-resolution display panels- including 4K/8K LCD, OLED, and Micro LED- this high-purity powder provides the sub-nanometer surface flatness essential for uniform light emission and high-density pixel alignment. Our formulations utilize precision-graded
التشطيب الصناعي للتربة النادرة الملمعة للزجاج الكريستالي
Industrial Abrasives For Crystal Glass Polishing Description Lichen Industrial Abrasives for Crystal Glass Polishing are specially formulated cerium oxide-based abrasives designed for high-precision polishing of crystal glass surfaces. Whether polishing fine crystal glassware, decorative glass, or optical crystal, our abrasives ensure a flawless, high-clarity finish that meets the highest standards of optical quality and aesthetic appeal. Lichen's abrasives are formulated to
رقائق السيليكون الزجاجية الأرض النادرة البوليسة الدلو الكيميائي الميكانيكي المخططية CeO2
Polishing Slurry for Silicon Wafer Polishing Description Achieve atomic-level planarity and superior surface integrity with our Series Cerium Oxide (CeO₂) Polishing Slurries. Specifically engineered for Chemical Mechanical Planarization (CMP) in advanced semiconductor manufacturing, our slurries are optimized for the transition to smaller process nodes. By leveraging the unique chemical-mechanical synergy of high-purity ceria, our formulations deliver high material removal
أكسيد السريوم الأبيض مسحوق البوليسة للأراضي النادرة لصبغة الكريستالات الفوتونية
Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent surface quality and dimensional accuracy required in photonic crystal structures, this product enables controlled material removal while preserving delicate micro- and nano-scale
أودم أكسيد السيريوم (Cerium oxide) زجاجات التلميع للأرض النادرة للزجاج الكهروضوئي
Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards
1.2μm أكسيد السيريوم مسحوق التلميع للأراضي النادرة للزجاج الأمامي للسيارات
Polishing Powder For Automotive Glass Finishing Description Lichen Polishing Powder for Automotive Glass Finishing is a premium-grade abrasive designed specifically for automotive windshields, side windows, and sunroofs. Engineered for efficient material removal and smooth surface finishing, this polishing powder ensures scratch-free, optically clear glass surfaces that meet the rigorous standards of the automotive industry. With controlled particle size distribution and
0.8μM أكسيد السيريوم الأرض النادرة البوليسة السمادية مطحنة لبرز البصريات تحت الحمراء IR
Cerium Oxide For Polishing High-index Infrared (IR) Optics Description Lichen Cerium Oxide for Polishing High-Index Infrared (IR) Optics is a high-purity ceria-based polishing material engineered for the precision finishing of high-index IR optical components. Leveraging cerium oxide’s unique chemical–mechanical polishing characteristics, this product delivers efficient material removal, low surface roughness, and excellent surface uniformity on demanding IR substrates.
0.2μm زئبق التلميع للأرض النادرة لتنظيف الزجاج في الشاشة Cas 1306-38-3
Polishing Slurry for Display Glass Cleaning Description Maintain peak production yields and pristine optical clarity with our Series Cerium Oxide (CeO₂) Cleaning Slurries. Specifically engineered for the global display industry, these slurries are designed for the high-speed cleaning, light defect removal, and surface preparation of LCD, OLED, and Touchscreen glass. Unlike standard polishing abrasives, our cleaning formulations focus on surface activation and the removal of
CMP أكسيد السيريوم الأرض النادرة البوليسة مسحوق السلوري للسيليكون الوافر حسب الطلب
Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit
