"rare earth metal"
Solid Rare Metal Earth Cerium Acetate Hydrate Powder For Catalyst
Cerium Acetate Molecular Formula: Ce(AC)xHO Appearance: Cerium acetate is a white snowflake-like solid Application: Used as a raw material for other cerium salts and cerium oxide, as well as petroleum additives, etc. Item Specification Testing Standard Item Ce(AC)3-3N5 Ce(AC)3-4N Ce(AC)3-4N5 Ce(AC)3-5N TREO(wt%) 45 45 45 45 Rare Earth Relative Purity (wt%) La2O3/TREO 0.01 0.005 0.003 0.0004 GB/T 18115.2 CeO2/TREO 99.95 99.99 99.995 99.999 Pr6O11/TREO 0.01 0
Competitive Price Lanthanum Cerium Carbonate in big size
Large particle size Lanthanum Cerium Carbonate Molecular Formula: (LaCe)(CO) Appearance: Coarse particle lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder. Item Specification Testing Standard Item (LaCe) 2 (CO 3 ) 3 -65CeB1 (LaCe) 2 (CO 3 ) 3 -65CeB2 TREO(wt%) 45.0 45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La 2 O 3 /TREO 352 352 GB/T 18115.1 CeO 2 /TREO 652 652 Pr 6 O 11 /TREO 0
High Quality Lanthanum Oxalate.
Lanthanum(III) Oxalate Lanthanum(III) oxalate is an oxalate salt of trivalent lanthanum and an important rare earth compound, which generally exists in the form of hydrate. 1. Basic Information Chinese Name: Lanthanum Oxalate English Name: Lanthanum(III) oxalate Chemical Formula: (decahydrate is common) Molecular Weight (Anhydrous): 541.88 CAS No.: Anhydrous: 537-03-1 Hydrate: 10344-18-0 2. Physical and Chemical Properties Appearance: White crystal or crystalline powder
Metallic LaCl3 Lanthanum Chloride Sandy for petroleum catalyst
THE BEST FACTORY DIRECT SALES PROFESSIONAL LANTHANUM CHLORIDE (SANDY) Lanthanum Chloride (Sandy) Molecular Formula: LaCl6HOAppearance: Sandy crystalApplication: Used as petroleum catalyst, and also for the production of metallic lanthanum Item GradeSpecification LaCl-3N5A LaCl-4N5A LaCl-5NA Test Basis TREO (wt%) 42.0 42.0 42.0 Rare Earth Relative Purity (wt%) LaO/TREO 99.95 99.995 99.999 Refer to GB/T 18115.1 CeO/TREO 0.01 0.003 0.0005 PrO/TREO 0.01 0
UV Protective Metal CMP Cerium Oxide Slurry For Pre Coating Glass Polishing
Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural
Cerium Oxide (CeO₂) For Three-Way Catalysts | Automotive Emission Control Catalyst Material
Cerium Oxide (CeO) For Three-Way Catalysts | Automotive Emission Control Catalyst Material Description Cerium Oxide (CeO) is a critical rare earth material widely used as an oxygen storage and release component in automotive catalytic converters. It plays a central role in Three-Way Catalyst (TWC) systems by improving catalytic efficiency and enabling effective control of vehicle exhaust emissions. Through its unique reversible redox behavior between Ce and Ce states,
High Surface Area Cerium Oxide For Automotive Catalytic Converter Production
High Surface Area Cerium Oxide For Automotive Catalytic Converter Production Description Cerium Oxide (CeO) is an essential functional material used in the manufacturing of automotive catalytic converters and advanced emission control systems. Acting as an oxygen storage and redox catalyst component, cerium oxide enhances catalytic efficiency by stabilizing exhaust gas reactions under fluctuating engine operating conditions. Key Features Efficient Oxygen Storage & Release
Anhydrous Dysprosium Powder Neodymium Chloride raw material
Anhydrous Neodymium Chloride Molecular Formula: NdClAppearance: Anhydrous neodymium chloride is a pink powdery crystal. Application: Used for producing metallic neodymium, as a raw material in the field of pharmaceutical catalysis or single crystal growth. Item Specification Testing Standard Grade NdCl-3N NdCl-3N5 NdCl-4N / TREO (wt%) 66.0 66.0 66.0 / Rare Earth Relative Purity (wt%) Refer to GB/T 18115.1 LaO/TREO 0.02 0.01 0.001 CeO/TREO 0.02 0.01 0.001 PrO
CMP Cerium Oxide Polishing Powder For Semiconductor Glass Wafer
Cerium Oxide Polishing Powder for Semiconductor Wafers Description Lichen Cerium Oxide Polishing Powder for Semiconductor Wafers is a high-purity, precision-engineered abrasive designed for wafer surface finishing and planarization processes. With tightly controlled particle size distribution and low metallic impurities, this polishing powder delivers uniform material removal, excellent surface smoothness, and low defect density, supporting the stringent requirements of
CMP Cerium Polish Powder Cerium Oxide For Glass Polishing Silicon Wafer
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle
Odm Cerium Oxide Based Abrasive Powders And Compounds Polishing Lapping Slurry
Polishing Slurry for Ultra-Fine Electronics Surfaces Overview: Our Polishing Slurry for Ultra-Fine Electronics Surfaces is meticulously engineered to deliver precise, high-quality finishes for the most delicate electronics applications. With advanced cerium oxide-based technology, this slurry is designed for the polishing of ultra-fine surfaces in the electronics industry, ensuring smoothness, clarity, and minimal defects. Key Features: High Purity Cerium Oxide: Formulated
Fine Planarization Cerium Oxide Slurry For Semiconductor Glass
Slurry For Fine Planarization Of Semiconductor Glass Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern
