"rare earth metal"
Feststoff seltener Erdmetalle Ceriumacetat Hydratpulver für Katalysatoren
Cerium Acetate Molecular Formula: Ce(AC)₃·xH₂O Appearance: Cerium acetate is a white snowflake-like solid Application: Used as a raw material for other cerium salts and cerium oxide, as well as petroleum additives, etc. Item Specification Testing Standard Item Ce(AC)3-3N5 Ce(AC)3-4N Ce(AC)3-4N5 Ce(AC)3-5N TREO(wt%) ≥45 ≥45 ≥45 ≥45 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr6O11/TREO ≤0.01 ≤0
Wettbewerbsfähiger Preis Lanthanum-Cerium-Carbonat in großer Größe
Large particle size Lanthanum Cerium Carbonate Molecular Formula: (LaCe)₂(CO₃)₃ Appearance: Coarse particle lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder. Item Specification Testing Standard Item (LaCe) 2 (CO 3 ) 3 -65CeB1 (LaCe) 2 (CO 3 ) 3 -65CeB2 TREO(wt%) ≥45.0 ≥45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La 2 O 3 /TREO 35±2 35±2 GB/T 18115.1 CeO 2 /TREO 65±2 65±2 Pr 6 O 11 /TREO ≤0
Lanthan-Oxalat von hoher Qualität.
Lanthanum(III) Oxalate Lanthanum(III) oxalate is an oxalate salt of trivalent lanthanum and an important rare earth compound, which generally exists in the form of hydrate. 1. Basic Information Chinese Name: Lanthanum Oxalate English Name: Lanthanum(III) oxalate Chemical Formula: (decahydrate is common) Molecular Weight (Anhydrous): 541.88 CAS No.: Anhydrous: 537-03-1 Hydrate: 10344-18-0 2. Physical and Chemical Properties Appearance: White crystal or crystalline powder
Metall LaCl3 Lanthanchlorid Sand für den Erdölkatalysator
THE BEST FACTORY DIRECT SALES PROFESSIONAL LANTHANUM CHLORIDE (SANDY) Lanthanum Chloride (Sandy) Molecular Formula: LaCl₃·6H₂OAppearance: Sandy crystalApplication: Used as petroleum catalyst, and also for the production of metallic lanthanum Item GradeSpecification LaCl₃-3N5A LaCl₃-4N5A LaCl₃-5NA Test Basis TREO (wt%) ≥42.0 ≥42.0 ≥42.0 Rare Earth Relative Purity (wt%) La₂O₃/TREO ≥99.95 ≥99.995 ≥99.999 Refer to GB/T 18115.1 CeO₂/TREO ≤0.01 ≤0.003 ≤0.0005 Pr₆O₁₁/TREO ≤0.01 ≤0
UV-Schutzmetall CMP Cerium-Oxid-Schlamm für die Vorbeschichtung Glaspolieren
Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural
Cerium-Oxid (CeO2) für Drei-Wege-Katalysatoren.
Cerium Oxide (CeO₂) For Three-Way Catalysts | Automotive Emission Control Catalyst Material Description Cerium Oxide (CeO₂) is a critical rare earth material widely used as an oxygen storage and release component in automotive catalytic converters. It plays a central role in Three-Way Catalyst (TWC) systems by improving catalytic efficiency and enabling effective control of vehicle exhaust emissions. Through its unique reversible redox behavior between Ce⁴⁺ and Ce³⁺ states,
Hochoberflächenaktives Ceroxid für die Herstellung von Automobilkatalysatoren
High Surface Area Cerium Oxide For Automotive Catalytic Converter Production Description Cerium Oxide (CeO₂) is an essential functional material used in the manufacturing of automotive catalytic converters and advanced emission control systems. Acting as an oxygen storage and redox catalyst component, cerium oxide enhances catalytic efficiency by stabilizing exhaust gas reactions under fluctuating engine operating conditions. Key Features Efficient Oxygen Storage & Release
Halbleiterqualitäts-Ceroxid-Poliermittel für Wafer & fortschrittliche Substrate
Semiconductor Grade Cerium Oxide Polishing Powder for Wafer & Advanced Substrates Product Overview Semiconductor Grade Cerium Oxide Polishing Powder is formulated for defect-sensitive polishing applications in semiconductor and advanced electronic substrate manufacturing. The controlled purity and particle engineering reduce contamination risks while ensuring consistent planarization performance. Optimized for preparation of CMP slurries used in semiconductor wafer processing
Wasserloses Dysprosiumpulver Neodymchlorid Rohstoff
Anhydrous Neodymium Chloride Molecular Formula: NdCl₃Appearance: Anhydrous neodymium chloride is a pink powdery crystal. Application: Used for producing metallic neodymium, as a raw material in the field of pharmaceutical catalysis or single crystal growth. Item Specification Testing Standard Grade NdCl₃-3N NdCl₃-3N5 NdCl₃-4N / TREO (wt%) ≥66.0 ≥66.0 ≥66.0 / Rare Earth Relative Purity (wt%) Refer to GB/T 18115.1 La₂O₃/TREO ≤0.02 ≤0.01 ≤0.001 CeO₂/TREO ≤0.02 ≤0.01 ≤0.001 Pr₆O₁
CMP-Cerium-Oxid-Polierpulver für Halbleiterglaswafer
Cerium Oxide Polishing Powder for Semiconductor Wafers Description Lichen Cerium Oxide Polishing Powder for Semiconductor Wafers is a high-purity, precision-engineered abrasive designed for wafer surface finishing and planarization processes. With tightly controlled particle size distribution and low metallic impurities, this polishing powder delivers uniform material removal, excellent surface smoothness, and low defect density, supporting the stringent requirements of
CMP Cerium Polish Pulver Cerium Oxid zum Polieren von Glas
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle
Odm Abrasivpulver und -verbindungen auf Cerium-Oxidbasis
Polishing Slurry for Ultra-Fine Electronics Surfaces Overview: Our Polishing Slurry for Ultra-Fine Electronics Surfaces is meticulously engineered to deliver precise, high-quality finishes for the most delicate electronics applications. With advanced cerium oxide-based technology, this slurry is designed for the polishing of ultra-fine surfaces in the electronics industry, ensuring smoothness, clarity, and minimal defects. Key Features: High Purity Cerium Oxide: Formulated
