150 Results For

"powder rare earth product"

Qualität La2o3 Lanthan-Oxid-Pulver mit hoher Reinheit für optisches Glas Fabrik

La2o3 Lanthan-Oxid-Pulver mit hoher Reinheit für optisches Glas

HIGH PURITY LANTHANUM OXIDE (LA2O3) POWDER( 3N5/4N/5N) /CERAMICS GRADE FOR OPTICAL GLASS, CATALYST, PHOSPHOR High Purity Lanthanum Oxide Molecular Formula: La₂O₃Appearance: High purity lanthanum oxide is a white powder. Application: Used in three-way catalysts, glass, ceramic and electronic industries; it is also applied to manufacture precision optical glass and optical fibers. In the electronic industry, it serves as ceramic capacitors and a dopant for piezoelectric

Qualität 1.1 μm Ceriumoxid Reibverbindungspulver zum Polieren von Edelsteinen Fabrik

1.1 μm Ceriumoxid Reibverbindungspulver zum Polieren von Edelsteinen

Fine Particle Polishing Powder for Optics Description Achieve uncompromising surface quality with our Fine Particle Cerium Oxide Polishing Powders. Specifically engineered for advanced optical manufacturing standards. By combining tightly controlled particle morphology with optimized chemical reactivity, our powders deliver a superior Chemical-Mechanical Polishing (CMP) action that ensures rapid material removal while maintaining an ultra-low scatter, pit-free finish. Key

Qualität Metall LaCl3 Lanthanchlorid Sand für den Erdölkatalysator Fabrik

Metall LaCl3 Lanthanchlorid Sand für den Erdölkatalysator

THE BEST FACTORY DIRECT SALES PROFESSIONAL LANTHANUM CHLORIDE (SANDY) Lanthanum Chloride (Sandy) Molecular Formula: LaCl₃·6H₂OAppearance: Sandy crystalApplication: Used as petroleum catalyst, and also for the production of metallic lanthanum Item GradeSpecification LaCl₃-3N5A LaCl₃-4N5A LaCl₃-5NA Test Basis TREO (wt%) ≥42.0 ≥42.0 ≥42.0 Rare Earth Relative Purity (wt%) La₂O₃/TREO ≥99.95 ≥99.995 ≥99.999 Refer to GB/T 18115.1 CeO₂/TREO ≤0.01 ≤0.003 ≤0.0005 Pr₆O₁₁/TREO ≤0.01 ≤0

Qualität Halbleiterpolieren Ceo2 Oxid Schlamm hohe Präzision 1,0 μm Fabrik

Halbleiterpolieren Ceo2 Oxid Schlamm hohe Präzision 1,0 μm

Polishing Slurry for High-Precision Semiconductor Manufacturing Overview: Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in wafer surface finishing, ensuring ultra-smooth surfaces essential for next-generation semiconductor devices. Key Features: High Purity Cerium Oxide: Utilizes advanced cerium oxide

Qualität Schrottfreie Schleimung Schleimung Ceriumoxid Abrasiv für Smartphone-Kameraobjektive Fabrik

Schrottfreie Schleimung Schleimung Ceriumoxid Abrasiv für Smartphone-Kameraobjektive

Scratch-free Cerium Oxide Slurry For Smartphone Camera Lenses Description Our Scratch-free Cerium Oxide Slurry is specially formulated to deliver premium polishing performance for smartphone camera lenses. Designed to provide superior surface quality while preventing surface damage, this cerium oxide slurry is ideal for achieving high-precision finishes on optical lenses, ensuring clarity, scratch resistance, and minimal distortion in high-quality smartphone cameras. Key

Qualität Cerium-Oxid-Verbindung Ceo2-Schlamm zum Polieren für chemisch verstärktes Glas Fabrik

Cerium-Oxid-Verbindung Ceo2-Schlamm zum Polieren für chemisch verstärktes Glas

Polishing Slurry For Chemically Strengthened Glass Description Lichen Cerium-Based Polishing Slurry for Chemically Strengthened Glass is a high-purity, ready-to-use slurry specifically formulated for the fine polishing and surface finishing of chemically strengthened glass. Designed to work effectively on glass that has undergone ion-exchange strengthening processes, this slurry delivers excellent surface smoothness, high gloss, and low defect density without compromising the

Qualität High-Purity Nano Ceria CMP Slurry (200nm Partikelgröße) für Halbleiter entwickelt Fabrik

High-Purity Nano Ceria CMP Slurry (200nm Partikelgröße) für Halbleiter entwickelt

High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next-generation precision polishing processes demanding nanometer-level surface control. Key Features & Advantages Nano-Scale Precision Polishing The 100 nm ceria particles enable

Qualität angepasste chemische mechanische Polierung CMP Schlamm Sub-Nanometer-LCD-Panel Fabrik

angepasste chemische mechanische Polierung CMP Schlamm Sub-Nanometer-LCD-Panel

Customized Polishing Slurry for LCD Panel Manufacturing Description Engineered for the stringent demands of display technologies, our customized cerium oxide slurries provide the high-precision finishing required for high-generation LCD and liquid crystal glass substrates. As automotive and consumer electronics move toward ultra-thin and curved profiles, our slurries deliver the sub-nanometer flatness and surface integrity essential for uniform light transmission. Core

Qualität Cerium-Oxid-Verbindungen Schlamm Abrasiv für optische Glassubstrate Fabrik

Cerium-Oxid-Verbindungen Schlamm Abrasiv für optische Glassubstrate

Cerium Oxide Slurry For Glass Substrates Description Our Cerium Oxide Slurry for Glass Substrates is engineered for high-precision polishing of a wide range of glass materials. Formulated with high-purity cerium oxide and a stable dispersion system, this slurry delivers excellent surface smoothness, controlled material removal, and low defect generation. It is ideal for applications requiring optical-grade finishes and high production consistency. Key Features High Purity

Qualität Planalisierung Ceriumoxid Schlamm Abrasive Polierpaste für Halbleiterglas Fabrik

Planalisierung Ceriumoxid Schlamm Abrasive Polierpaste für Halbleiterglas

Cerium Oxide Slurry For Semiconductor Glass Substrates Description Lichen Cerium Oxide Slurry for Semiconductor Glass Substrates is a high-purity, water-based polishing slurry formulated specifically for semiconductor glass applications. This slurry provides excellent material removal rates, consistent surface finishes, and precise planarization, making it ideal for polishing semiconductor glass substrates used in wafer-level packaging, photomasks, and advanced integrated

Qualität Super-Cerium-Oxid für Glaspolieren Fabrik

Super-Cerium-Oxid für Glaspolieren

Cerium Oxide Slurry For Display Cover Glass Description Lichen Cerium Oxide Slurry for Display Cover Glass is a high-purity, water-based slurry formulated for the precision polishing of display cover glass. Specifically designed for use in the manufacturing of smartphone screens, tablet covers, and other consumer electronics with glass touch surfaces, our cerium oxide slurry ensures excellent surface quality, enhanced optical clarity, and high durability. This slurry

Qualität Kratzfestigkeit Cerium-Oxid-Schlamm zum Polieren von Glas 0,6 μM Fabrik

Kratzfestigkeit Cerium-Oxid-Schlamm zum Polieren von Glas 0,6 μM

Cerium Oxide Slurry For Display Cover Glass Description Lichen Cerium Oxide Slurry for Display Cover Glass is a high-purity, water-based slurry designed for the precision polishing of display cover glass used in smartphones, tablets, wearables, and other consumer electronics. Formulated with ultra-fine cerium oxide particles, this slurry ensures superior surface smoothness, optical clarity, and scratch resistance, providing a premium finish for high-end glass covers. Perfect