"nano rare earth material"
99.9% 99.99% 99.999% Cerium Oxide Rare Earth Material Powder 4N 5N Nano
Best Price for 99.9% 99.99% 99.999% Cerium Oxide Rare Earth Powder 4N 5N NANO Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Testing Standard Item CeO2-3N5C CeO2-4NC CeO2-4N5C CeO2-5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 ...
50nm Rare Earth Compound Ceria Cerium Oxide Ceo2 Nanopowder
50 nm Rare Earth Compound Ceria (Cerium Oxide) CeO₂ Nanopowder Overview: Lichen 50 nm Rare Earth Compound Ceria (Cerium Oxide) CeO₂ Nanopowder is a high-quality nano-scale material engineered for applications requiring precise particle size control, high surface area, and stable chemical performance...
CMP Cerium Oxide Rare Earth Polishing Slurry Powder For Silicon Wafer Custom
Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. ...
White Cerium Oxide Rare Earth Polishing Powder Paste For Photonic Crystal Substrates
Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent ...
RARE EARTH LANTHANUM OXIDE POWDER LA2O3 POWDER PRICE 99.999%
RARE EARTH LANTHANUM OXIDE POWDER LA2O3 POWDER PRICE 99.999% Purity 99.999% Place of Origin Inner Mongolia , China Classification lanthanum oxide Model Number LY-La2O3 Brand Name nano Appearance powder Application Fluorescent materials Grade Standard Industrial Grade MF La2O3 Other Names La2O3 ...
CMP Cerium Polish Powder Cerium Oxide For Glass Polishing Silicon Wafer
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing ...
