98 Results For

"cerium oxide polishing compound"

Jakość Ceriumoksalantowy proszek Elementy reaktora chemicznego Fabryka

Ceriumoksalantowy proszek Elementy reaktora chemicznego

Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically

Jakość Związek ziem rzadkich, tlenek ytrium w proszku. Fabryka

Związek ziem rzadkich, tlenek ytrium w proszku.

Factory Supply High Quality Yttrium Oxide Powder Product Description Product Name Yttrium oxide MF O3Y2 EINECS 215-233-5 Appearance white powder MOQ 1 kg, please consult for details Sample And Customize Support Delivery Time 7-15 days Shipping Method sea freight,land transport,air transport,express delivery Package standard packaging Payment Method ALL Place of Origin Inner Mongolia, China Brand As per customers’ demand Production Capacity 4000 tons/year Quality Top Quality

Jakość Próżki do polerowania szkła optycznego do zastosowań przemysłu fotonicznego Fabryka

Próżki do polerowania szkła optycznego do zastosowań przemysłu fotonicznego

Tailored Polishing Powder for Photonics Industry Description Elevate your photonics manufacturing with our ultra-high purity, tailored cerium oxide (CeO₂) polishing powders. Engineered specifically for the rigorous demands of precision photonics and fiber optics. As photonics systems move toward higher speeds and complex freeform geometries, our tailored powders provide the stability and precision necessary to minimize signal loss and maximize device efficiency. Key Features

Jakość 1.0μM Proszek polerowy ziem rzadkich dla przemysłu fotonicznego PH neutralny Fabryka

1.0μM Proszek polerowy ziem rzadkich dla przemysłu fotonicznego PH neutralny

Polishing Powder for Photonics Industry Description Our Polishing Powder for the Photonics Industry is specially engineered to meet the demanding requirements of optical and photonic component fabrication. Designed for precision polishing, this high-performance powder is ideal for lenses, mirrors, prisms, optical fibers, and waveguides used in cutting-edge photonic applications. Key Features: Exceptional Purity: Manufactured with the highest-quality materials, our polishing

Jakość Materiały do polerowania w proszku ziem rzadkich na bazie cerium do przetwarzania płaskiego szkła Cas 1306 38 3 Fabryka

Materiały do polerowania w proszku ziem rzadkich na bazie cerium do przetwarzania płaskiego szkła Cas 1306 38 3

Polishing Materials For Flat Glass Processing Description Lichen Cerium-Based Polishing Materials for Flat Glass Processing are specially formulated abrasives designed to meet the stringent demands of the flat glass industry. Whether for architectural glass, automotive glass, or glass for electronics, our high-purity cerium oxide materials deliver exceptional polishing results, ensuring high-quality finishes with low surface roughness and minimal defects. Our products are

Jakość Wysokiej precyzji Sapphire Optical Polishing Powder Cas 1306-38-3 OEM Fabryka

Wysokiej precyzji Sapphire Optical Polishing Powder Cas 1306-38-3 OEM

Cerium Oxide Polishing Powder for Electronics Components Overview: Our Polishing Powder for Optical Surface Finishing is expertly designed to deliver flawless, high-precision finishes for optical components. Formulated with premium cerium oxide, this powder provides exceptional performance in polishing delicate optical surfaces, ensuring the highest levels of clarity, smoothness, and accuracy. Whether you're working with lenses, mirrors, prisms, or other optical devices, our

Jakość Przemysłowe polerowanie ziem rzadkich Slurry do polerowania szkła kryształowego Fabryka

Przemysłowe polerowanie ziem rzadkich Slurry do polerowania szkła kryształowego

Industrial Abrasives For Crystal Glass Polishing Description Lichen Industrial Abrasives for Crystal Glass Polishing are specially formulated cerium oxide-based abrasives designed for high-precision polishing of crystal glass surfaces. Whether polishing fine crystal glassware, decorative glass, or optical crystal, our abrasives ensure a flawless, high-clarity finish that meets the highest standards of optical quality and aesthetic appeal. Lichen's abrasives are formulated to

Jakość Konkurencyjna cena i wysoka czystość proszku wodorotlenku ceru, surowca ziem rzadkich Fabryka

Konkurencyjna cena i wysoka czystość proszku wodorotlenku ceru, surowca ziem rzadkich

Competitive Price &High Purity Cerium Hydroxide Rare Earth Powder Raw Material Cerium(IV) Hydroxide Cerium(IV) hydroxide, usually referring to tetravalent cerium hydroxide, is an important rare earth compound with the chemical formula Ce(OH)₄ . 1. Basic Information · CAS No.: 12014-56-1 · Molecular Weight: 208.15 · Synonyms: Ceric hydroxide, hydrated cerium dioxide 2. Physical and Chemical Properties · Appearance: Amorphous powder in light yellow, brownish yellow or off-white

Jakość Półprzewodnik CeO2 Ceria Slurry Cerium pow. polerowania szkła na bazie cerium Fabryka

Półprzewodnik CeO2 Ceria Slurry Cerium pow. polerowania szkła na bazie cerium

Custom Polishing Powder for High-Purity Semiconductor Wafers Description Lichen Polishing Powder for Ultra-Flat Semiconductor Surface Finishing is a high-performance cerium oxide-based polishing powder designed to achieve exceptionally flat and smooth surfaces required for advanced semiconductor manufacturing. Whether polishing silicon wafers or compound semiconductors, our powder ensures ultra-flat surfaces with low roughness and uniform thickness, making it ideal for high

Jakość Polerowanie półprzewodników tlenkiem Ceo2 Slurry Wysoka precyzja 1,0 μm Fabryka

Polerowanie półprzewodników tlenkiem Ceo2 Slurry Wysoka precyzja 1,0 μm

Polishing Slurry for High-Precision Semiconductor Manufacturing Overview: Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in wafer surface finishing, ensuring ultra-smooth surfaces essential for next-generation semiconductor devices. Key Features: High Purity Cerium Oxide: Utilizes advanced cerium oxide

Jakość Bez zarysowań zawiesina Ceria CMP do polerowania półprzewodników i płytek krzemowych Fabryka

Bez zarysowań zawiesina Ceria CMP do polerowania półprzewodników i płytek krzemowych

Scratch-Free Ceria CMP Slurry for Semiconductor & Silicon Wafer Polishing Product Overview Scratch-Free Cerium Oxide CMP Slurry is specially formulated for semiconductor wafer and advanced substrate polishing where defect control and ultra-smooth surfaces are critical. The engineered nano-scale ceria particles provide superior defect reduction while maintaining stable removal efficiency. Ideal for silicon wafer finishing and precision semiconductor fabrication processes. Key

Jakość Bez zarysowania szkło samochodowe proszek do polerowania ziem rzadkich Fabryka

Bez zarysowania szkło samochodowe proszek do polerowania ziem rzadkich

Automotive Glass Polishing Powder For Clear FinishingDescriptionLichen Automotive Glass Polishing Powder for Clear Finishing is a premium cerium oxide-based polishing powder specifically formulated to deliver crystal-clear finishes on automotive glass surfaces. Designed for windshields, side windows, mirrors, and headlight lenses, this polishing powder ensures high optical clarity while removing surface imperfections such as scratches, haze, and water spots.Ideal for both OEM