104 Results For

"cerium oxide polishing compound"

品質 オキシドセリウム化合物 粘土 光学ガラス基板のための磨材 工場

オキシドセリウム化合物 粘土 光学ガラス基板のための磨材

Cerium Oxide Slurry For Glass Substrates Description Our Cerium Oxide Slurry for Glass Substrates is engineered for high-precision polishing of a wide range of glass materials. Formulated with high-purity cerium oxide and a stable dispersion system, this slurry delivers excellent surface smoothness, controlled material removal, and low defect generation. It is ideal for applications requiring optical-grade finishes and high production consistency. Key Features High Purity

品質 セリアムオキシドセリア フォトマスク用風車ガラス磨き粉 空白宝石2.0μm 工場

セリアムオキシドセリア フォトマスク用風車ガラス磨き粉 空白宝石2.0μm

Low-defect Cerium Oxide For Photomask Blank Polishing Description Our Low-defect Cerium Oxide is specifically formulated for the precision polishing of photomask blanks in semiconductor manufacturing. With a focus on minimizing defects and ensuring a flawless finish, this high-performance cerium oxide is ideal for photomask applications where surface quality is critical. Offering exceptional polishing efficiency and surface integrity, our cerium oxide ensures the highest

品質 半導体ウエファー磨き用のカスタマイズされたセリウム磨き粉末ペスト 工場

半導体ウエファー磨き用のカスタマイズされたセリウム磨き粉末ペスト

Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern semiconducto

品質 Cerium Oxide Metal CMP エレクトロニクス用稀土磨きスラム ガラス 環境に優しい 工場

Cerium Oxide Metal CMP エレクトロニクス用稀土磨きスラム ガラス 環境に優しい

Polishing Slurry for Consumer Electronics Glass Overview: Our Polishing Slurry for Consumer Electronics Glass is expertly formulated to deliver pristine, high-quality finishes on glass surfaces used in a wide range of consumer electronics. With its advanced cerium oxide composition, this slurry ensures ultra-smooth surfaces that enhance the clarity, durability, and appearance of glass used in smartphones, tablets, wearables, and other electronic devices. Key Features: High

品質 ISO9001 ポリシング セリウムオキシド 電子半導体ガラス用稀土ポリシングスラー 工場

ISO9001 ポリシング セリウムオキシド 電子半導体ガラス用稀土ポリシングスラー

High Purity Polishing Slurry For OLED Displays Description Lichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability. Our slurry is ideal for polishing the glass substrates and fine

品質 CMPセリウムオキシド 稀土の磨きスラープーダー シリコン・ウェーファー オーダーメイド 工場

CMPセリウムオキシド 稀土の磨きスラープーダー シリコン・ウェーファー オーダーメイド

Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit

品質 セリウムシュウ酸塩粉末 化学試薬 元素 工場

セリウムシュウ酸塩粉末 化学試薬 元素

Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically

品質 希少地球化合物 イトリウム酸化物粉末 工場

希少地球化合物 イトリウム酸化物粉末

Factory Supply High Quality Yttrium Oxide Powder Product Description Product Name Yttrium oxide MF O3Y2 EINECS 215-233-5 Appearance white powder MOQ 1 kg, please consult for details Sample And Customize Support Delivery Time 7-15 days Shipping Method sea freight,land transport,air transport,express delivery Package standard packaging Payment Method ALL Place of Origin Inner Mongolia, China Brand As per customers’ demand Production Capacity 4000 tons/year Quality Top Quality

品質 1.0μM 光子産業用稀土磨き粉 PH 中性 工場

1.0μM 光子産業用稀土磨き粉 PH 中性

Polishing Powder for Photonics Industry Description Our Polishing Powder for the Photonics Industry is specially engineered to meet the demanding requirements of optical and photonic component fabrication. Designed for precision polishing, this high-performance powder is ideal for lenses, mirrors, prisms, optical fibers, and waveguides used in cutting-edge photonic applications. Key Features: Exceptional Purity: Manufactured with the highest-quality materials, our polishing

品質 光子産業用 グラス オプティカル ポーリング パウダー 工場

光子産業用 グラス オプティカル ポーリング パウダー

Tailored Polishing Powder for Photonics Industry Description Elevate your photonics manufacturing with our ultra-high purity, tailored cerium oxide (CeO₂) polishing powders. Engineered specifically for the rigorous demands of precision photonics and fiber optics. As photonics systems move toward higher speeds and complex freeform geometries, our tailored powders provide the stability and precision necessary to minimize signal loss and maximize device efficiency. Key Features

品質 Cerium ベースの稀土の磨き粉末材料 平面ガラスの加工用 Cas 1306 38 3 工場

Cerium ベースの稀土の磨き粉末材料 平面ガラスの加工用 Cas 1306 38 3

Polishing Materials For Flat Glass Processing Description Lichen Cerium-Based Polishing Materials for Flat Glass Processing are specially formulated abrasives designed to meet the stringent demands of the flat glass industry. Whether for architectural glass, automotive glass, or glass for electronics, our high-purity cerium oxide materials deliver exceptional polishing results, ensuring high-quality finishes with low surface roughness and minimal defects. Our products are

品質 高精度サファイア光学磨き粉 CAS 1306-38-3 OEM 工場

高精度サファイア光学磨き粉 CAS 1306-38-3 OEM

Cerium Oxide Polishing Powder for Electronics Components Overview: Our Polishing Powder for Optical Surface Finishing is expertly designed to deliver flawless, high-precision finishes for optical components. Formulated with premium cerium oxide, this powder provides exceptional performance in polishing delicate optical surfaces, ensuring the highest levels of clarity, smoothness, and accuracy. Whether you're working with lenses, mirrors, prisms, or other optical devices, our