"cerium oxide polishing compound"
PH 中性セリウムオキシド 自動車ディスプレイガラス用岩石ポリッシュスラム
Slurry For Polishing Of In-car Display Glass Description Lichen Slurry for Polishing In-Car Display Glass is a high-purity cerium oxide-based slurry designed specifically for the demanding requirements of automotive display glass polishing. This slurry is formulated to deliver superior surface smoothness, high optical clarity, and scratch-free finishes on the glass surfaces used in in-car displays, touchscreens, and instrument clusters. Ideal for automotive infotainment
0.8μMセリウム酸化物 稀土の磨きスローラ 紫外線光学を磨く用
Cerium Oxide For Polishing High-index Infrared (IR) Optics Description Lichen Cerium Oxide for Polishing High-Index Infrared (IR) Optics is a high-purity ceria-based polishing material engineered for the precision finishing of high-index IR optical components. Leveraging cerium oxide’s unique chemical–mechanical polishing characteristics, this product delivers efficient material removal, low surface roughness, and excellent surface uniformity on demanding IR substrates.
サファイアセリウムオキシド 高精度アスフェリックレンズ用稀土磨きスラー
Cerium Oxide For High-precision Aspheric Lens Manufacturing Description Our Cerium Oxide for High-Precision Aspheric Lens Manufacturing is specifically engineered to meet the stringent surface quality and accuracy requirements of advanced optical lens production. Designed for polishing complex aspheric geometries, this high-quality cerium oxide delivers exceptional surface smoothness, form accuracy, and optical clarity, making it ideal for applications in imaging optics,
半導体用セリウムオキシド光学ガラス磨き粉
Cerium Oxide For Polishing High-index Infrared (IR) Optics Description Our Cerium Oxide for Polishing High-Index Infrared (IR) Optics is specially developed to meet the demanding surface quality requirements of infrared optical components. Optimized for high-index IR materials, this cerium-based polishing product delivers controlled material removal, ultra-low surface roughness, and minimal sub-surface damage—critical for maintaining optical performance in IR systems. Key
半導体ガラスのための精細平面化セリウム酸化物スラム
Slurry For Fine Planarization Of Semiconductor Glass Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern
スクラッチ削減ガラスポリシングパスタ 3ミクロンセリウム酸化物ベースの粉末
Scratch-reduction Polishing Powder For Smartphone Cover GlassDescriptionLichen Scratch-Reduction Polishing Powder for Smartphone Cover Glass is a high-performance cerium oxide-based powder designed to deliver smooth, scratch-free finishes on smartphone cover glass. Whether you're working with sapphire glass, or other advanced smartphone glass materials, this polishing powder is specially formulated to enhance the optical clarity and durability of mobile device screens, while
CMP セリウム ポリッシュ 粉 玻璃 ポリッシュ ためのセリウム オキシード シリコン ウェーファー
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle
ODM セリウムオキシド 光伏のカバーガラスのための稀土の磨きスラム
Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards
ナノセリアCMPスラム 100nm 半導体のための高性能セリア酸化CMPスラム
Nano Ceria CMP Slurry 100nm | High-Performance Cerium Oxide CMP Slurry For Semiconductor Descripti on Nano Ceria CMP Slurry (100 nm) is a high-performance chemical mechanical polishing (CMP) material formulated using ultra-fine nanometer cerium oxide particles. The slurry is engineered for high-precision planarization, defect control, and superior surface quality required in semiconductor manufacturing. Through optimized particle size distribution and controlled surface
OEMセリウム酸化ガラス粉 半導体フロントガラスのためのポリッシュスラリー粉
High Purity Cerium Oxide Slurry for Semiconductor Description Deliver atomic-level planarity for the most demanding 2026 semiconductor nodes with our High-Purity Cerium Oxide (Ceria) Slurries. Specifically engineered for Chemical Mechanical Planarization (CMP). Atomic-Scale Planarization: Achieve superior surface finishes with root-mean-square (RMS) roughness below 0.2 nm, essential for the ultra-fine geometries of next-generation integrated circuits. Integrated Self-Stopping
1.2μmセリウムオキシド 自動車ガラスのフロントガラスのための稀土の磨き粉
Polishing Powder For Automotive Glass Finishing Description Lichen Polishing Powder for Automotive Glass Finishing is a premium-grade abrasive designed specifically for automotive windshields, side windows, and sunroofs. Engineered for efficient material removal and smooth surface finishing, this polishing powder ensures scratch-free, optically clear glass surfaces that meet the rigorous standards of the automotive industry. With controlled particle size distribution and
光学ガラスの擦り取り除去剤を磨く 粉末 防風ガラスのためのセリウム酸化物
Polishing Powder for Optical Glass Manufacturing Description Lichen Polishing Powder for Optical Glass Manufacturing is a premium-grade optical polishing material engineered to deliver consistent material removal, excellent surface smoothness, and stable process performance across a wide range of optical glass types. Formulated using high-purity abrasives with controlled particle size distribution, this polishing powder supports the demanding requirements of precision optics
