品質 Planarization Cerium Oxide Slurry Abrasive Polishing Paste For Semiconductor Glass 工場
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品質 Planarization Cerium Oxide Slurry Abrasive Polishing Paste For Semiconductor Glass 工場
品質 Planarization Cerium Oxide Slurry Abrasive Polishing Paste For Semiconductor Glass 工場
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Planarization Cerium Oxide Slurry Abrasive Polishing Paste For Semiconductor Glass

ブランド名: LICHEN
モデル番号: LCR0210
原産地: 中国
認証: ISO9001
最小注文数量: 20KGS
価格: NEGOCIABLE
供給能力: 250MT/月

製品詳細


粒子サイズ: 0.8~2.2μm CAS番号: 1306-38-3
CeO₂: 99% 停止率: 高い
Ph 範囲: 7-10 応用: 半導体ガラス基板
ハイライト

Cerium Oxide Slurry Paste

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Planarization Cerium Oxide Slurry

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Cerium abrasive polishing paste

製品の説明

Cerium Oxide Slurry For Semiconductor Glass Substrates

Description

Lichen Cerium Oxide Slurry for Semiconductor Glass Substrates is a high-purity, water-based polishing slurry formulated specifically for semiconductor glass applications. This slurry provides excellent material removal rates, consistent surface finishes, and precise planarization, making it ideal for polishing semiconductor glass substrates used in wafer-level packaging, photomasks, and advanced integrated circuit fabrication.

Designed for use in Chemical-Mechanical Planarization (CMP) processes, Lichen's cerium oxide slurry offers stable performance in high-volume production environments while maintaining the critical surface quality and uniformity demanded by the semiconductor industry.

 

Key Features & Advantages

Ultra-High Purity Cerium Oxide
Reduced metal content prevents contamination of sensitive semiconductor processes and ensures superior surface finishes.

Optimized Particle Size and Distribution
Fine, uniform abrasives ensure smooth material removal, minimizing defects and improving yield during CMP processes.

Superior Surface Planarization
Achieves ultra-flat surfaces with low roughness, making it suitable for advanced semiconductor packaging and photomask applications.

Low Defect Generation
Reduces micro-scratches, surface pits, and other defects that can affect the integrity of semiconductor devices.

Stable and Consistent Performance
Batch-to-batch consistency ensures predictable results in high-throughput semiconductor manufacturing.

 

Tech Data

Molecular Formula CAS No. CeO₂ %  D50 (μm) Appearance Application
CeO2 1306-38-3 99 0.8-2.2μm White Slurry Semiconductor Glass Substrates

 

Particle Size Distribution

 

Planarization Cerium Oxide Slurry Abrasive Polishing Paste For Semiconductor Glass 0

Q&A

1. What is rare earth polishing powder?

Rare earth polishing powder is a high-purity compound used for polishing optical components, semiconductor wafers, and delicate surfaces like glass and lenses. It delivers a smooth, high-clarity finish without damaging the material.

2. How do I choose the right rare earth polishing powder for my application?

To select the ideal polishing powder, consider factors like the material you’re polishing, the required finish, and specifications like particle size and purity. Our sales team is available to help you choose the perfect product for your needs.

3. How should I store  rare earth polishing powder?

Store in a cool, dry place, away from moisture and direct sunlight. Keep the powder in airtight containers to prevent contamination and maintain its effectiveness. With proper storage, it typically lasts 1-2 years.

4. Do you provide customized rare earth formulations?

Yes, we offer custom rare earth polishing powders and slurries, tailored to meet your specific needs, including adjustments to particle size, chemical composition, or slurry consistency.

5. Can I get a sample before making a bulk order?

Absolutely! We provide samples for evaluation. Contact our team to request a sample, and we’ll arrange the shipment.

6. How can I place an order? What is the typical delivery time?

To place an order, simply contact our sales team, who will guide you through the process and provide a quote. Delivery times vary based on order size, location, and stock availability, and we’ll give you an estimated schedule once the order is confirmed.

製品 ハイライト

Cerium Oxide Slurry For Semiconductor Glass Substrates Description Lichen Cerium Oxide Slurry for Semiconductor Glass Substrates is a high-purity, water-based polishing slurry formulated specifically for semiconductor glass applications. This slurry provides excellent material removal rates, ...

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