Nano-Grade Cerium Oxide Slurry for TFT-LCD Surface Finishing
Szczegóły produktu
| Czystość CeO₂: | ≥99,9% | TREO: | ≥99,0% |
|---|---|---|---|
| Rozmiar cząstek D50: | 100-200 nm | Wygląd: | Jasnożółty proszek |
| pH (szlam): | 6-9 | Opakowanie: | Dostosowane |
| Podkreślić |
Nano-Grade Cerium Oxide Slurry,Cerium Oxide for TFT-LCD Finishing,Rare Earth Polishing Powder Slurry |
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Opis produktu
Nano-Grade Cerium Oxide Slurry for TFT-LCD Surface Finishing
Product Overview
Nano-engineered cerium oxide slurry optimized for TFT-LCD panel surface finishing. Designed for ultra-smooth planarization, it ensures defect-free polishing in high-end display production lines.
Key Features
- Nano-scale dispersion stability
- High uniformity for ultra-flat surfaces
- Enhanced polishing efficiency at low pressure
- Suitable for high-precision CMP processes
Particle Size Distribution
Applications
- TFT-LCD panel surface planarization
- Thin film display polishing
- High-end electronic glass finishing
- Precision optical display components
Frequently Asked Questions
Q: What advantage does nano-slurry offer over powder?
A: It provides better dispersion, reduced defect rates, and improved process stability.
Q: Is it compatible with automated production lines?
A: Yes, it is designed for full integration into CMP systems.
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