Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
Szczegóły produktu
| Czystość CeO₂: | ≥99,9% | TREO: | ≥99,0% |
|---|---|---|---|
| Rozmiar cząstek D50: | 1,0–2,0 μm | Wygląd: | Jasnożółty proszek |
| pH (szlam): | 6-9 | Gęstość nasypowa: | 0,8–1,2 g/cm3 |
| Podkreślić |
low-defect cerium oxide polishing powder,cerium oxide TFT-LCD manufacturing material,rare earth polishing powder for LCD |
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Opis produktu
Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
Product Overview
Specially engineered cerium oxide polishing material designed for next-generation TFT-LCD manufacturing, focusing on ultra-low defect rates and high throughput production efficiency.
Key Features
- Ultra-low scratch and haze performance
- High polishing efficiency for mass production
- Strong chemical stability in slurry systems
- Optimized for high-yield display manufacturing
- Consistent batch-to-batch quality
Particle Size Distribution
Applications
- TFT-LCD manufacturing lines
- Large-size display glass polishing
- High-resolution panel production
- Advanced display substrate processing
Frequently Asked Questions
Q: What makes this product suitable for high-volume manufacturing?
A: Its stability, low defect generation, and consistent removal rate support industrial-scale production.
Q: Does it reduce post-polishing cleaning requirements?
A: Yes, low residue formulation minimizes downstream cleaning load.
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