Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
제품 상세정보
| CeO2 순도: | ≥99.9% | 트레오: | ≥99.0% |
|---|---|---|---|
| D50 입자 크기: | 1.0~2.0μm | 모습: | 밝은 노란색 분말 |
| pH(슬러리): | 6-9 | 벌크 밀도: | 0.8~1.2g/cm³ |
| 강조하다 |
low-defect cerium oxide polishing powder,cerium oxide TFT-LCD manufacturing material,rare earth polishing powder for LCD |
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제품 설명
Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
Product Overview
Specially engineered cerium oxide polishing material designed for next-generation TFT-LCD manufacturing, focusing on ultra-low defect rates and high throughput production efficiency.
Key Features
- Ultra-low scratch and haze performance
- High polishing efficiency for mass production
- Strong chemical stability in slurry systems
- Optimized for high-yield display manufacturing
- Consistent batch-to-batch quality
Particle Size Distribution
Applications
- TFT-LCD manufacturing lines
- Large-size display glass polishing
- High-resolution panel production
- Advanced display substrate processing
Frequently Asked Questions
Q: What makes this product suitable for high-volume manufacturing?
A: Its stability, low defect generation, and consistent removal rate support industrial-scale production.
Q: Does it reduce post-polishing cleaning requirements?
A: Yes, low residue formulation minimizes downstream cleaning load.
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시리움 산화물 첨단 세라믹 및 전자 재료의 기능성 첨가물
첨단 세라믹 및 전자재료용 산화세륨 기능성 첨가제 제품개요 산화세륨은 고급 세라믹, 전자 부품, 페라이트 재료, 센서 및 유전체 응용 분야에 사용되는 중요한 기능성 첨가제입니다. 결정립 미세화, 소결 최적화, 전기적 성능 향상에 기여하여 고부가가치 산업제품 생산을 지원합니다. 주요 특징 제어된 곡물 성장을 촉진합니다. 소결 효율 향상 기계적 강도를 향상시킵니다. 열 안정성 증가 전기적 특성 최적화 지원 고급 세라믹 제제에 적합 입자 크기 분포tion 응용 페라이트 재료 전자 세라믹 구조용 세라믹 다층 세라믹 부품 유전체 재료 산소 ...
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