Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
تفاصيل المنتج
| نقاء CeO₂: | ≥99.9% | تريو: | 99.0 ٪ |
|---|---|---|---|
| حجم الجسيمات D50: | 1.0-2.0 ميكرومتر | مظهر: | مسحوق أصفر فاتح |
| الرقم الهيدروجيني (الملاط): | 6-9 | الكثافة الظاهرية: | 0.8-1.2 جم/سم3 |
| إبراز |
low-defect cerium oxide polishing powder,cerium oxide TFT-LCD manufacturing material,rare earth polishing powder for LCD |
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وصف المنتج
Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
Product Overview
Specially engineered cerium oxide polishing material designed for next-generation TFT-LCD manufacturing, focusing on ultra-low defect rates and high throughput production efficiency.
Key Features
- Ultra-low scratch and haze performance
- High polishing efficiency for mass production
- Strong chemical stability in slurry systems
- Optimized for high-yield display manufacturing
- Consistent batch-to-batch quality
Particle Size Distribution
Applications
- TFT-LCD manufacturing lines
- Large-size display glass polishing
- High-resolution panel production
- Advanced display substrate processing
Frequently Asked Questions
Q: What makes this product suitable for high-volume manufacturing?
A: Its stability, low defect generation, and consistent removal rate support industrial-scale production.
Q: Does it reduce post-polishing cleaning requirements?
A: Yes, low residue formulation minimizes downstream cleaning load.
أبرز المنتجات
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Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
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أكسيد السيليوم إضافة وظيفية للمواد السيراميكية والإلكترونية المتقدمة
مادة مضافة وظيفية من أكسيد السيريوم للسيراميك والمواد الإلكترونية المتقدمة نظرة عامة على المنتج يعد أكسيد السيريوم مادة مضافة وظيفية مهمة تستخدم في السيراميك المتقدم والمكونات الإلكترونية ومواد الفريت وأجهزة الاستشعار والتطبيقات العازلة. فهو يساهم في صقل الحبوب، وتحسين التلبيد، وتحسين الأداء الكهربا...
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