High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates
تفاصيل المنتج
| نقاء CeO₂: | ≥99.9% | تريو: | 99.0 ٪ |
|---|---|---|---|
| حجم الجسيمات D50: | 0.8-1.5 ميكرومتر | مظهر: | مسحوق أصفر فاتح |
| الرقم الهيدروجيني (الملاط): | 6-9 | التعبئة والتغليف: | حسب الطلب |
| إبراز |
cerium oxide polishing powder for TFT-LCD,high-purity cerium oxide powder,rare earth polishing powder for glass |
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وصف المنتج
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates
Product Overview
High-purity cerium oxide polishing powder designed for ultra-precision finishing of TFT-LCD glass substrates. It delivers excellent material removal control, superior surface flatness, and minimal micro-scratches, making it suitable for advanced display manufacturing environments.
Key Features
- Ultra-high purity ceria formulation
- Excellent removal rate with controlled surface roughness
- Low defect (scratch/dig) performance
- Stable particle size distribution for consistent polishing
- Compatible with automated CMP (Chemical Mechanical Polishing) systems
Particle Size Distribution
Applications
- TFT-LCD glass substrate polishing
- Flat panel display (FPD) manufacturing
- Optical-grade glass finishing
- Semiconductor display components
Frequently Asked Questions
Q: Why is cerium oxide used in TFT-LCD polishing?
A: It provides a unique chemical-mechanical interaction with silica-based glass, enabling high efficiency and low-defect polishing.
Q: Can particle size be customized?
A: Yes, particle distribution can be tailored based on process requirements.
أبرز المنتجات
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates Product Overview High-purity cerium oxide polishing powder designed for ultra-precision finishing of TFT-LCD glass substrates. It delivers excellent material removal control, superior surface flatness, and minimal micro-scratches...
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High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates Product Overview High-purity cerium oxide polishing powder designed for ultra-precision finishing of TFT-LCD glass substrates. It delivers excellent material removal control, superior surface flatness, and minimal micro-scratches...
أكسيد السيليوم إضافة وظيفية للمواد السيراميكية والإلكترونية المتقدمة
مادة مضافة وظيفية من أكسيد السيريوم للسيراميك والمواد الإلكترونية المتقدمة نظرة عامة على المنتج يعد أكسيد السيريوم مادة مضافة وظيفية مهمة تستخدم في السيراميك المتقدم والمكونات الإلكترونية ومواد الفريت وأجهزة الاستشعار والتطبيقات العازلة. فهو يساهم في صقل الحبوب، وتحسين التلبيد، وتحسين الأداء الكهربا...
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