High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates
Dettagli del prodotto
| Purezza del CeO₂: | ≥99,9% | TREO: | ≥99,0% |
|---|---|---|---|
| Dimensione delle particelle D50: | 0,8–1,5 μm | Aspetto: | Polvere giallo chiaro |
| pH (liquame): | 6-9 | Confezione: | Personalizzato |
| Evidenziare |
cerium oxide polishing powder for TFT-LCD,high-purity cerium oxide powder,rare earth polishing powder for glass |
||
Descrizione di prodotto
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates
Product Overview
High-purity cerium oxide polishing powder designed for ultra-precision finishing of TFT-LCD glass substrates. It delivers excellent material removal control, superior surface flatness, and minimal micro-scratches, making it suitable for advanced display manufacturing environments.
Key Features
- Ultra-high purity ceria formulation
- Excellent removal rate with controlled surface roughness
- Low defect (scratch/dig) performance
- Stable particle size distribution for consistent polishing
- Compatible with automated CMP (Chemical Mechanical Polishing) systems
Particle Size Distribution

Applications
- TFT-LCD glass substrate polishing
- Flat panel display (FPD) manufacturing
- Optical-grade glass finishing
- Semiconductor display components
Frequently Asked Questions
Q: Why is cerium oxide used in TFT-LCD polishing?
A: It provides a unique chemical-mechanical interaction with silica-based glass, enabling high efficiency and low-defect polishing.
Q: Can particle size be customized?
A: Yes, particle distribution can be tailored based on process requirements.
Caratteristiche del prodotto
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates Product Overview High-purity cerium oxide polishing powder designed for ultra-precision finishing of TFT-LCD glass substrates. It delivers excellent material removal control, superior surface flatness, and minimal micro-scratches...
Nano-Grade Cerium Oxide Slurry for TFT-LCD Surface Finishing
Nano-Grade Cerium Oxide Slurry for TFT-LCD Surface Finishing Product Overview Nano-engineered cerium oxide slurry optimized for TFT-LCD panel surface finishing. Designed for ultra-smooth planarization, it ensures defect-free polishing in high-end display production lines. Key Features Nano-scale ...
Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing
Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing Product Overview Specially engineered cerium oxide polishing material designed for next-generation TFT-LCD manufacturing, focusing on ultra-low defect rates and high throughput production efficiency. Key Features Ultra-low ...
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates
High-Purity Cerium Oxide Polishing Powder for TFT-LCD Glass Substrates Product Overview High-purity cerium oxide polishing powder designed for ultra-precision finishing of TFT-LCD glass substrates. It delivers excellent material removal control, superior surface flatness, and minimal micro-scratches...
Additivo funzionale all'ossido di cerio per materiali ceramici ed elettronici avanzati
Additivo funzionale all'ossido di cerio per materiali ceramici ed elettronici avanzati Panoramica del prodotto L'ossido di cerio è un importante additivo funzionale utilizzato in ceramiche avanzate, componenti elettronici, materiali di ferrite, sensori e applicazioni dielettriche. Contribuisce all...
Se avete domande, usate il modulo di contatto online qui sotto, il nostro team vi contatterà il prima possibile.