Competitive Price Lanthanum Cerium Carbonate in big size
Product Details
| Productname: | Rare Earth Material | Electricalconductivity: | Moderate To High |
|---|---|---|---|
| Applications: | Electronics, Magnets, Catalysts, Batteries | Physicalform: | Powder, Metal, Oxide |
| Magneticproperties: | Paramagnetic Or Ferromagnetic | Meltingpoint: | 700 - 1500 °C (depending On Element) |
| Color: | Silvery White To Gray | Source: | Mining And Extraction From Minerals Like Bastnäsite, Monazite |
| Chemicalcomposition: | Varies (e.g., Lanthanides, Scandium, Yttrium) | Purity: | 99.9%+ |
| Density: | 4.5 - 7.0 G/cm³ (depending On Element) | Shelflife: | 2-5 Years Under Proper Storage |
| Hazards: | Toxic Dust, Flammable In Powder Form | Storageconditions: | Dry, Cool, And Well-ventilated Area |
| Highlight |
lanthanum cerium carbonate rare earth compound,big size lanthanum cerium carbonate,competitive price rare earth carbonate |
||
Product Description
Large particle size Lanthanum Cerium Carbonate
Molecular Formula: (LaCe)₂(CO₃)₃
Appearance: Coarse particle lanthanum cerium carbonate is a white powder
Application: Used for the production of rare earth polishing powder.
|
Item |
Specification |
Testing Standard |
|
|
Item |
(LaCe)2(CO3)3-65CeB1 |
(LaCe)2(CO3)3-65CeB2 |
|
|
TREO(wt%) |
≥45.0 |
≥45.0 |
|
|
Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) |
|||
|
La2O3/TREO |
35±2 |
35±2 |
GB/T 18115.1 |
|
CeO2 /TREO |
65±2 |
65±2 |
|
|
Pr6O11 /TREO |
≤0.01 |
≤0.005 |
|
|
Nd2O3/TREO |
≤0.01 |
≤0.005 |
|
|
Sm2O3/TREO |
≤0.0005 |
≤0.0002 |
|
|
Y2O3/TREO |
≤0.0005 |
≤0.0002 |
|
|
Non-Rare Earth Impurities Content (wt%) |
|||
|
CaO |
≤0.05 |
≤0.03 |
GB/T 16484 |
|
MgO |
≤0.005 |
≤0.003 |
|
|
SO42- |
≤0.03 |
≤0.03 |
|
|
ZnO |
≤0.001 |
≤0.001 |
|
|
Fe2O3 |
≤0.002 |
≤0.002 |
|
|
Cl- |
≤0.05 |
≤0.05 |
|
|
SiO2 |
≤0.015 |
≤0.01 |
|
|
D50 |
≥30 |
≥30 |
参照GB/T 20170.1 |
|
Note: Coarse particle lanthanum cerium carbonate is insoluble in water and soluble in acids.
Packaging: This product is usually packed in 50kg or 1000kg, and can also be packed according to customer requirements. The packaging material is a woven bag lined with a plastic bag. |
|||
Product Highlights
Large particle size Lanthanum Cerium Carbonate Molecular Formula: (LaCe)₂(CO₃)₃ Appearance: Coarse particle lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder. Item Specification Testing Standard Item (LaCe)2(CO3)3-65CeB1 (LaCe)2(CO3)3...
High QualitySolid Rare Cerium Acetate Hydrate Powder For Catalyst
Cerium Acetate Molecular Formula: Ce(AC)₃·xH₂O Appearance: Cerium acetate is a white snowflake-like solid Application: Used as a raw material for other cerium salts and cerium oxide, as well as petroleum additives, etc. Item Specification Testing Standard Item Ce(AC) 3 -3N5 Ce(AC) 3 -4N Ce(AC) 3 -4N5 Ce(AC) 3 -5N TREO(wt%) ≥45 ≥45 ≥45 ≥45 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO 2 /TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr 6 O
Competitive Price Lanthanum Cerium Carbonate in big size
Large particle size Lanthanum Cerium Carbonate Molecular Formula: (LaCe)₂(CO₃)₃ Appearance: Coarse particle lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder. Item Specification Testing Standard Item (LaCe) 2 (CO 3 ) 3 -65CeB1 (LaCe) 2 (CO 3 ) 3 -65CeB2 TREO(wt%) ≥45.0 ≥45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La 2 O 3 /TREO 35±2 35±2 GB/T 18115.1 CeO 2 /TREO 65±2 65±2 Pr 6 O 11 /TREO ≤0
Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing
Ultra-Low Defect Cerium Oxide CMP Slurry For Semiconductor Silicon Wafer Manufacturing Product Overview Our ultra-low defect cerium oxide CMP slurry is designed to meet the stringent requirements of next-generation semiconductor fabrication. The slurry delivers precise chemical-mechanical interaction between abrasive particles and silicon surfaces, enabling atomic-scale planarization required for advanced nodes and high-performance devices. Engineered for compatibility with
Advanced Ceria CMP Slurry For Silicon Wafer Polishing And Semiconductor Surface Planarization
Advanced Ceria CMP Slurry For Silicon Wafer Polishing And Semiconductor Surface Planarization Product Overview This advanced ceria-based CMP slurry is optimized for high-precision silicon wafer polishing where nanoscale surface control is required. The chemically active cerium oxide particles promote efficient material removal while preserving crystal integrity and minimizing subsurface damage. The slurry enables improved wafer flatness, reduced dishing and erosion effects,
Please use our online inquiry contact form below if you have any questions, our team will get back to you as soon as possible.
