High Purity Cerium Oxide Polishing Powder for Glass Substrate Polishing
Product Details
| Chemical Formula: | CeO₂ | Purity: | ≥99.9% |
|---|---|---|---|
| Particle Size (D50): | 0.5-2.5 μm (Customizable) | Color: | Light Yellow Powder |
| PH: | 6.5-8.5 | Packaging: | 20 Kg Carton/Bag |
| Highlight |
high purity cerium oxide powder,cerium oxide glass polishing powder,rare earth glass substrate polish |
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Product Description
High Purity Cerium Oxide Polishing Powder for Glass Substrate Polishing
Product Overview
Lichen High Purity Cerium Oxide Polishing Powder is engineered for precision polishing of glass substrates used in electronic displays, semiconductor processing, optical components, and advanced industrial applications. Manufactured from premium rare earth materials under strict quality control, it provides excellent polishing efficiency, superior surface finish, and stable slurry performance.
The optimized particle size distribution enables rapid material removal while minimizing scratches and surface defects, making it suitable for both manual and automated polishing systems.
Key Features
- High purity cerium oxide with consistent chemical composition
- Excellent polishing rate and high production efficiency
- Produces ultra-smooth, defect-free glass surfaces
- Low scratch generation and reduced subsurface damage
- Uniform particle size distribution for stable polishing performance
- Excellent slurry dispersion and suspension stability
- Compatible with various polishing machines and pad materials
- Suitable for continuous industrial production
Particle Size Distribution
Applications
- LCD glass substrate polishing
- Display panel glass finishing
- Cover glass polishing
- Optical glass polishing
- Thin glass substrate processing
- Touch panel glass manufacturing
- Precision electronic glass polishing
- Laboratory glass polishing
- Specialty industrial glass finishing
Frequently Asked Questions
Q1. Can particle size be customized?
Yes. Various particle sizes are available to match different polishing equipment and surface finish requirements.
Q2. Is the powder suitable for automatic polishing equipment?
Yes. The material is designed for compatibility with both automatic polishing lines and manual polishing processes.
Q3. Does it generate scratches?
The optimized particle morphology minimizes scratching while maintaining excellent material removal rates.
Q4. Can it be supplied as polishing slurry?
Yes. Lichen can manufacture ready-to-use cerium oxide polishing slurry according to customer specifications.
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