"powder rare earth material"
Solid Rare Metal Earth Cerium Acetate Hydrate Powder For Catalyst 50kg
Cerium Acetate Molecular Formula: Ce(AC)xHO Appearance: Cerium acetate is a white snowflake-like solid Application: Used as a raw material for other cerium salts and cerium oxide, as well as petroleum additives, etc. Item Specification Testing Standard Item Ce(AC)3-3N5 Ce(AC)3-4N Ce(AC)3-4N5 Ce(AC)3-5N TREO(wt%) 45 45 45 45 Rare Earth Relative Purity (wt%) La2O3/TREO 0.01 0.005 0.003 0.0004 GB/T 18115.2 CeO2/TREO 99.95 99.99 99.995 99.999 Pr6O11/TREO 0.01 0
Low Chloride Cerium Lanthanum Carbonate Powder Petroleum Additives
Petroleum Additives Low Chloride Lanthanum Cerium Carbonate Molecular Formula: (LaCe)(CO) Appearance: Low chloride lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder Item Specification Testing Standard Item (LaCe)2(CO3)3-65CeA1 (LaCe)2(CO3)3-65CeA2 TREO(wt%) 45.0 45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La2O3/TREO 352 352 GB/T 16484.3 CeO2 /TREO 652 652 Pr6O11 /TREO 0.01 0.005
Bulk Cerium Oxide Spherical Catalyst Powder Polishing Material 1000kg
HIGH SPECIFIC SURFACE AREA CERIUM OXIDE SPHERICAL POWDER FOR CERIUM-BASED CATALYSTS Cerium Oxide Molecular Formula: CeO Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Method Item CeO2-3N5C CeO2-4NC CeO2-4N5C CeO2-5NC TREO(wt%) 99.0 99.0 99.0 99.0 Rare Earth Relative Purity (wt%) La2O3/TREO 0.01 0.005 0.003 0.0004 GB/T 18115.2 CeO2/TREO 99.95 99.99 99.995 99.999 Pr6O11/TREO 0.01 0.002 0.001 0.0002
Powdered CeF3 Cerium Fluoride Crystal High Purity 99.99% For Optical Coating
CeF3 Crystal Cerium Fluoride High Purity 99.99% for Optical Coating or Suxiliary Solvent Molecular Formula: CeF Appearance: Cerium fluoride is a white powder Application: Used as high-purity chemical and coating material Item Specification Testing Standard Item CeF3-3N5 CeF3-4N CeF3-4N5 CeF3-5N TREO(wt%) 80 80 80 80 Rare Earth Relative Purity (wt%) La2O3/TREO 0.01 0.005 0.003 0.0004 GB/T 18115.2 CeO2/TREO 99.95 99.99 99.995 99.999 Pr6O11/TREO 0.01 0.002 0.001
Anhydrous Dysprosium Powder Neodymium Chloride raw material
Anhydrous Neodymium Chloride Molecular Formula: NdClAppearance: Anhydrous neodymium chloride is a pink powdery crystal. Application: Used for producing metallic neodymium, as a raw material in the field of pharmaceutical catalysis or single crystal growth. Item Specification Testing Standard Grade NdCl-3N NdCl-3N5 NdCl-4N / TREO (wt%) 66.0 66.0 66.0 / Rare Earth Relative Purity (wt%) Refer to GB/T 18115.1 LaO/TREO 0.02 0.01 0.001 CeO/TREO 0.02 0.01 0.001 PrO
Precision Ceo2 Cerium Oxide PH Neutral Polishing Powder High Purity 99%
High Purity Cerium Oxide Polishing Powder 99% Overview: Our High Purity Cerium Oxide Polishing Powder 99% is designed for precision polishing applications where the highest standards of quality, efficiency, and surface smoothness are required. Manufactured to a purity level of 99%, this cerium oxide polishing powder is ideal for polishing a wide range of materials, including glass, optical components, semiconductor wafers, and ceramics, ensuring exceptional surface finishes
High Precision Sapphire Optical Polishing Powder Cas 1306-38-3 OEM
Cerium Oxide Polishing Powder for Electronics Components Overview: Our Polishing Powder for Optical Surface Finishing is expertly designed to deliver flawless, high-precision finishes for optical components. Formulated with premium cerium oxide, this powder provides exceptional performance in polishing delicate optical surfaces, ensuring the highest levels of clarity, smoothness, and accuracy. Whether you're working with lenses, mirrors, prisms, or other optical devices, our
CMP Cerium Oxide Polishing Powder For Semiconductor Glass Wafer
Cerium Oxide Polishing Powder for Semiconductor Wafers Description Lichen Cerium Oxide Polishing Powder for Semiconductor Wafers is a high-purity, precision-engineered abrasive designed for wafer surface finishing and planarization processes. With tightly controlled particle size distribution and low metallic impurities, this polishing powder delivers uniform material removal, excellent surface smoothness, and low defect density, supporting the stringent requirements of
ISO PH Neutral Glass Polishing Powder For Ceramics Cas 1306-38-3
Polishing Powder For Glass Ceramics Description Lichen Polishing Powder for Glass Ceramics is a high-performance abrasive material specifically developed for the precision polishing of glass-ceramic substrates. Glass ceramics present unique challenges due to their mixed crystallineamorphous structure and high surface hardness. This polishing powder delivers controlled material removal, excellent surface smoothness, and low defect generation, making it ideal for both
White CeO2 Cerium Based Glass Polishing Powder 0.5μm OEM
Polishing Powder For Plate Glass Description Lichen Polishing Powder for Plate Glass is a high-quality abrasive material developed for the surface finishing and defect correction of flat and plate glass. Formulated with carefully controlled particle size distribution and stable abrasive characteristics, this polishing powder delivers efficient material removal, smooth surface finish, and consistent polishing performance across large glass areas. It is widely used in
Polishing Optical Glass Scratch Remover Powder Cerium Oxide For Windshield
Polishing Powder for Optical Glass Manufacturing Description Lichen Polishing Powder for Optical Glass Manufacturing is a premium-grade optical polishing material engineered to deliver consistent material removal, excellent surface smoothness, and stable process performance across a wide range of optical glass types. Formulated using high-purity abrasives with controlled particle size distribution, this polishing powder supports the demanding requirements of precision optics
CMP Cerium Polish Powder Cerium Oxide For Glass Polishing Silicon Wafer
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle
