120 Results For

"high purity cerium oxide"

Kwaliteit Hoge zuiverheid Ceriumhydroxide Zeldzame aardpoeder Fabriek

Hoge zuiverheid Ceriumhydroxide Zeldzame aardpoeder

Cerium Hydroxide Molecular Formula: Ce(OH)₄ Appearance: Cerium hydroxide is a pale yellow powder Application: Used as a clarifying and decolorizing agent in the glass industry, and as a raw material for the production of high-cerium compounds. Item Specification Testing Standard Item Ce(OH)4-3N5 Ce(OH)4-4N Ce(OH)4-4N5 Ce(OH)4-5N TREO(wt%) 55.0~70.0 55.0~70.0 55.0~70.0 55.0~70.0 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99

Kwaliteit Hoogzuivere Nano Ceria CMP Slurry (200nm Deeltjesgrootte) Ontworpen Voor Halfgeleiders Fabriek

Hoogzuivere Nano Ceria CMP Slurry (200nm Deeltjesgrootte) Ontworpen Voor Halfgeleiders

High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next-generation precision polishing processes demanding nanometer-level surface control. Key Features & Advantages Nano-Scale Precision Polishing The 100 nm ceria particles enable

Kwaliteit Cerium-oxide verbindingen slijm slijpmiddel voor optische glassubstraten Fabriek

Cerium-oxide verbindingen slijm slijpmiddel voor optische glassubstraten

Cerium Oxide Slurry For Glass Substrates Description Our Cerium Oxide Slurry for Glass Substrates is engineered for high-precision polishing of a wide range of glass materials. Formulated with high-purity cerium oxide and a stable dispersion system, this slurry delivers excellent surface smoothness, controlled material removal, and low defect generation. It is ideal for applications requiring optical-grade finishes and high production consistency. Key Features High Purity

Kwaliteit UV-beschermingsmetalen CMP Ceriumoxide-slam voor het polijsten van glas Fabriek

UV-beschermingsmetalen CMP Ceriumoxide-slam voor het polijsten van glas

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

Kwaliteit Gepersonaliseerde Ceriumpoederpasta voor het polijsten van halfgeleiderwafels Fabriek

Gepersonaliseerde Ceriumpoederpasta voor het polijsten van halfgeleiderwafels

Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern semiconducto

Kwaliteit Witte ceriumoxide zeldzame aardpoederpoederpasta voor fotonische kristalsubstraten Fabriek

Witte ceriumoxide zeldzame aardpoederpoederpasta voor fotonische kristalsubstraten

Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent surface quality and dimensional accuracy required in photonic crystal structures, this product enables controlled material removal while preserving delicate micro- and nano-scale

Kwaliteit Ceriumoxide Metal CMP Zeldzame aarden Polijstloer voor elektronica Glas milieuvriendelijk Fabriek

Ceriumoxide Metal CMP Zeldzame aarden Polijstloer voor elektronica Glas milieuvriendelijk

Polishing Slurry for Consumer Electronics Glass Overview: Our Polishing Slurry for Consumer Electronics Glass is expertly formulated to deliver pristine, high-quality finishes on glass surfaces used in a wide range of consumer electronics. With its advanced cerium oxide composition, this slurry ensures ultra-smooth surfaces that enhance the clarity, durability, and appearance of glass used in smartphones, tablets, wearables, and other electronic devices. Key Features: High

Kwaliteit ODM Ceriumoxide Zeldzame Aarde Polijstloer voor fotovoltaïsch dekselglas Fabriek

ODM Ceriumoxide Zeldzame Aarde Polijstloer voor fotovoltaïsch dekselglas

Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards

Kwaliteit CMP-glaspoetspoeder op basis van cerium-oxide voor platte schermdisplay ODM Fabriek

CMP-glaspoetspoeder op basis van cerium-oxide voor platte schermdisplay ODM

Polishing Powder for Flat Panel Display Polishing Description Optimize your large-format glass production for 2026 with our High-Efficiency Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for the Flat Panel Display industry, these powders deliver the nanometer-level flatness and optical clarity required for high-generation LCD and OLED substrates. Our formulations utilize advanced Chemical-Mechanical Polishing (CMP) technology to provide an ultra-clean, mirror

Kwaliteit Wit zeldzame aardstoffen ceriumpoeder olieadditieven polijstverbinding Fabriek

Wit zeldzame aardstoffen ceriumpoeder olieadditieven polijstverbinding

Chinese Supply High-Quality Spot White Cerium Oxide Powder petroleum additives Cerium Oxide (White) Molecular Formula: CeO₂Appearance: White powderApplication: Used as polishing material or other catalysts Item GradeSpecification CeO₂-3N5A CeO₂-4NA CeO₂-4N5A CeO₂-5NA Test Basis TREO (wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La₂O₃/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO₂/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr₆O₁₁/TREO ≤0.01 ≤0.002 ≤0.001 ≤0.0002

Kwaliteit CMP Cerium-oxide zeldzame aardspulpoeder voor siliciumwafers Fabriek

CMP Cerium-oxide zeldzame aardspulpoeder voor siliciumwafers

Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit

Kwaliteit Ceriumoxide spherisch katalysatorpoederpoetsmateriaal Fabriek

Ceriumoxide spherisch katalysatorpoederpoetsmateriaal

HIGH SPECIFIC SURFACE AREA CERIUM OXIDE SPHERICAL POWDER FOR CERIUM-BASED CATALYSTS Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Method Item CeO2-3N5C CeO2-4NC CeO2-4N5C CeO2-5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr6O11/TREO ≤0.01 ≤0.002 ≤0.001 ≤0.0002