"high purity cerium oxide"
オキシドセリウム化合物 粘土 光学ガラス基板のための磨材
Cerium Oxide Slurry For Glass Substrates Description Our Cerium Oxide Slurry for Glass Substrates is engineered for high-precision polishing of a wide range of glass materials. Formulated with high-purity cerium oxide and a stable dispersion system, this slurry delivers excellent surface smoothness, controlled material removal, and low defect generation. It is ideal for applications requiring optical-grade finishes and high production consistency. Key Features High Purity
紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング
Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural
半導体ウエファー磨き用のカスタマイズされたセリウム磨き粉末ペスト
Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern semiconducto
ホワイトセリウムオキシド 光子結晶基板のための稀土の磨き粉末ペスト
Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent surface quality and dimensional accuracy required in photonic crystal structures, this product enables controlled material removal while preserving delicate micro- and nano-scale
Cerium Oxide Metal CMP エレクトロニクス用稀土磨きスラム ガラス 環境に優しい
Polishing Slurry for Consumer Electronics Glass Overview: Our Polishing Slurry for Consumer Electronics Glass is expertly formulated to deliver pristine, high-quality finishes on glass surfaces used in a wide range of consumer electronics. With its advanced cerium oxide composition, this slurry ensures ultra-smooth surfaces that enhance the clarity, durability, and appearance of glass used in smartphones, tablets, wearables, and other electronic devices. Key Features: High
ODM セリウムオキシド 光伏のカバーガラスのための稀土の磨きスラム
Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards
CMP オキシド セリウム ベース ガラス ポーリング パウダー フラット パネル ディスプレイ ODM
Polishing Powder for Flat Panel Display Polishing Description Optimize your large-format glass production for 2026 with our High-Efficiency Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for the Flat Panel Display industry, these powders deliver the nanometer-level flatness and optical clarity required for high-generation LCD and OLED substrates. Our formulations utilize advanced Chemical-Mechanical Polishing (CMP) technology to provide an ultra-clean, mirror
白色稀土酸化セリウム粉 石油添加物 磨き化合物
Chinese Supply High-Quality Spot White Cerium Oxide Powder petroleum additives Cerium Oxide (White) Molecular Formula: CeO₂Appearance: White powderApplication: Used as polishing material or other catalysts Item GradeSpecification CeO₂-3N5A CeO₂-4NA CeO₂-4N5A CeO₂-5NA Test Basis TREO (wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La₂O₃/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO₂/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr₆O₁₁/TREO ≤0.01 ≤0.002 ≤0.001 ≤0.0002
CMPセリウムオキシド 稀土の磨きスラープーダー シリコン・ウェーファー オーダーメイド
Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit
セリウムオキシド球状触媒粉末磨き材料
HIGH SPECIFIC SURFACE AREA CERIUM OXIDE SPHERICAL POWDER FOR CERIUM-BASED CATALYSTS Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Method Item CeO2-3N5C CeO2-4NC CeO2-4N5C CeO2-5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr6O11/TREO ≤0.01 ≤0.002 ≤0.001 ≤0.0002
スクラッチリモバー ジルコニア ガラス ポーリング 粉 セリウムオキシド スラム ODM
Cerium oxide slurry for micro-scratch removal on display glass Description Particle Size: The powder typically features an ultra-fine, uniform particle size distribution, which is essential for achieving the extremely low surface roughness required for clear displays. Mechanism: The powder works through a synergistic chemical and mechanical process to smooth out imperfections like fine scratches, haziness, water spots, and sanding marks. Compatibility: It is safe for use on a
高性能フェライトの生産のためのランタン酸化物
Lanthanum Oxide for High-Performance Ferrite Production Product Overview Lanthanum Oxide (La₂O₃) is an important rare earth additive used in advanced ferrite manufacturing. It contributes to improved magnetic permeability, optimized crystal structure, enhanced temperature stability, and reduced magnetic losses. Lanthanum oxide is increasingly adopted by ferrite manufacturers supplying components for electric vehicles, renewable energy systems, 5G infrastructure, industrial
