91 Results For

"cerium oxide slurry"

Qualità Paste di polvere di lucidatura al cerio personalizzata per la lucidatura di wafer a semiconduttori Fabbrica

Paste di polvere di lucidatura al cerio personalizzata per la lucidatura di wafer a semiconduttori

Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern semiconducto

Qualità ISO9001 Polishing Cerium Oxide Rare Earth Polishing Slurry per vetro semiconduttore elettronico Fabbrica

ISO9001 Polishing Cerium Oxide Rare Earth Polishing Slurry per vetro semiconduttore elettronico

High Purity Polishing Slurry For OLED Displays Description Lichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability. Our slurry is ideal for polishing the glass substrates and fine

Qualità CMP Ossido di cerio di terre rare Polvere di liquame di lucidatura per wafer di silicio su misura Fabbrica

CMP Ossido di cerio di terre rare Polvere di liquame di lucidatura per wafer di silicio su misura

Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit

Qualità Ossido di cerio bianco polistirolo di terre rare pasta per substrati di cristalli fotonici Fabbrica

Ossido di cerio bianco polistirolo di terre rare pasta per substrati di cristalli fotonici

Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent surface quality and dimensional accuracy required in photonic crystal structures, this product enables controlled material removal while preserving delicate micro- and nano-scale

Qualità Dispositivo di lucidatura meccanica chimica su misura Fabbrica

Dispositivo di lucidatura meccanica chimica su misura

Customized Polishing Slurry for LCD Panel Manufacturing Description Engineered for the stringent demands of display technologies, our customized cerium oxide slurries provide the high-precision finishing required for high-generation LCD and liquid crystal glass substrates. As automotive and consumer electronics move toward ultra-thin and curved profiles, our slurries deliver the sub-nanometer flatness and surface integrity essential for uniform light transmission. Core

Qualità Prodotto chimico meccanico CMP Polvere di lucidatura di vetro Abrasivo personalizzato Fabbrica

Prodotto chimico meccanico CMP Polvere di lucidatura di vetro Abrasivo personalizzato

Fine Particle Polishing Powder for Display Glass Description Elevate your surface quality to the industry standard with our High-Purity Fine Particle Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for the next generation of high-resolution displays, our powders deliver the sub-nanometer flatness required for OLED, MicroLED, and high-PPI LCD substrates. By utilizing a proprietary milling process that ensures an exceptionally narrow particle size distribution,

Qualità Ossido di cerio ceria Polverizzazione del parabrezza per foto-maschera Gemma bianca 2.0 μm Fabbrica

Ossido di cerio ceria Polverizzazione del parabrezza per foto-maschera Gemma bianca 2.0 μm

Low-defect Cerium Oxide For Photomask Blank Polishing Description Our Low-defect Cerium Oxide is specifically formulated for the precision polishing of photomask blanks in semiconductor manufacturing. With a focus on minimizing defects and ensuring a flawless finish, this high-performance cerium oxide is ideal for photomask applications where surface quality is critical. Offering exceptional polishing efficiency and surface integrity, our cerium oxide ensures the highest

Qualità Lappaggio industriale Slurry di lucidatura delle terre rare per la lucidatura del vetro cristallino Fabbrica

Lappaggio industriale Slurry di lucidatura delle terre rare per la lucidatura del vetro cristallino

Industrial Abrasives For Crystal Glass Polishing Description Lichen Industrial Abrasives for Crystal Glass Polishing are specially formulated cerium oxide-based abrasives designed for high-precision polishing of crystal glass surfaces. Whether polishing fine crystal glassware, decorative glass, or optical crystal, our abrasives ensure a flawless, high-clarity finish that meets the highest standards of optical quality and aesthetic appeal. Lichen's abrasives are formulated to

Qualità Semiconduttore CeO2 Ceria Slurry Cerium Based Glass Polishing Powder Fabbrica

Semiconduttore CeO2 Ceria Slurry Cerium Based Glass Polishing Powder

Custom Polishing Powder for High-Purity Semiconductor Wafers Description Lichen Polishing Powder for Ultra-Flat Semiconductor Surface Finishing is a high-performance cerium oxide-based polishing powder designed to achieve exceptionally flat and smooth surfaces required for advanced semiconductor manufacturing. Whether polishing silicon wafers or compound semiconductors, our powder ensures ultra-flat surfaces with low roughness and uniform thickness, making it ideal for high

Qualità Acqua a base di CeO2 Slurry di lucidatura chimica meccanica per la rimozione dei difetti del vetro Fabbrica

Acqua a base di CeO2 Slurry di lucidatura chimica meccanica per la rimozione dei difetti del vetro

Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration

Qualità Slagro di polvere di lucidatura ad alta purezza Ceo2 per schermi OLED Fabbrica

Slagro di polvere di lucidatura ad alta purezza Ceo2 per schermi OLED

High Purity Polishing Slurry For OLED DisplaysDescriptionLichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability.Our slurry is ideal for polishing the glass substrates and fine

Qualità Materiali in polvere di lucidatura a base di cerio per vetro piatto Cas 1306 38 3 Fabbrica

Materiali in polvere di lucidatura a base di cerio per vetro piatto Cas 1306 38 3

Polishing Materials For Flat Glass Processing Description Lichen Cerium-Based Polishing Materials for Flat Glass Processing are specially formulated abrasives designed to meet the stringent demands of the flat glass industry. Whether for architectural glass, automotive glass, or glass for electronics, our high-purity cerium oxide materials deliver exceptional polishing results, ensuring high-quality finishes with low surface roughness and minimal defects. Our products are