101 Results For

"cerium oxide slurry"

Qualité 1Poudre de polissage de terres rares à l'oxyde de cérium de 0,2 μm pour pare-brise en verre automobile Usine

1Poudre de polissage de terres rares à l'oxyde de cérium de 0,2 μm pour pare-brise en verre automobile

Polishing Powder For Automotive Glass Finishing Description Lichen Polishing Powder for Automotive Glass Finishing is a premium-grade abrasive designed specifically for automotive windshields, side windows, and sunroofs. Engineered for efficient material removal and smooth surface finishing, this polishing powder ensures scratch-free, optically clear glass surfaces that meet the rigorous standards of the automotive industry. With controlled particle size distribution and

Qualité Polissage de verre optique en poudre pour éliminer les rayures Oxyde de cérium pour pare-brise Usine

Polissage de verre optique en poudre pour éliminer les rayures Oxyde de cérium pour pare-brise

Polishing Powder for Optical Glass Manufacturing Description Lichen Polishing Powder for Optical Glass Manufacturing is a premium-grade optical polishing material engineered to deliver consistent material removal, excellent surface smoothness, and stable process performance across a wide range of optical glass types. Formulated using high-purity abrasives with controlled particle size distribution, this polishing powder supports the demanding requirements of precision optics

Qualité Poudre de polissage de verre à base d'oxyde de cérium pour affichage à écran plat Usine

Poudre de polissage de verre à base d'oxyde de cérium pour affichage à écran plat

Polishing Powder for Flat Panel Display Polishing Description Optimize your large-format glass production for 2026 with our High-Efficiency Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for the Flat Panel Display industry, these powders deliver the nanometer-level flatness and optical clarity required for high-generation LCD and OLED substrates. Our formulations utilize advanced Chemical-Mechanical Polishing (CMP) technology to provide an ultra-clean, mirror

Qualité Oxyde de cérium métal CMP Slurry de polissage des terres rares Pour l'électronique verre Eco-friendly Usine

Oxyde de cérium métal CMP Slurry de polissage des terres rares Pour l'électronique verre Eco-friendly

Polishing Slurry for Consumer Electronics Glass Overview: Our Polishing Slurry for Consumer Electronics Glass is expertly formulated to deliver pristine, high-quality finishes on glass surfaces used in a wide range of consumer electronics. With its advanced cerium oxide composition, this slurry ensures ultra-smooth surfaces that enhance the clarity, durability, and appearance of glass used in smartphones, tablets, wearables, and other electronic devices. Key Features: High

Qualité ODM Oxyde de cérium Slurry de polissage des terres rares pour le verre de couverture photovoltaïque Usine

ODM Oxyde de cérium Slurry de polissage des terres rares pour le verre de couverture photovoltaïque

Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards

Qualité Pâte de poudre de polissage au cérium personnalisée pour le polissage de gaufres à semi-conducteurs Usine

Pâte de poudre de polissage au cérium personnalisée pour le polissage de gaufres à semi-conducteurs

Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern semiconducto

Qualité ISO9001 Polissage de l'oxyde de cérium des terres rares Polissage des boues pour verre électronique à semi-conducteurs Usine

ISO9001 Polissage de l'oxyde de cérium des terres rares Polissage des boues pour verre électronique à semi-conducteurs

High Purity Polishing Slurry For OLED Displays Description Lichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability. Our slurry is ideal for polishing the glass substrates and fine

Qualité CMP Oxyde de cérium Poussière de lisier de polissage des terres rares Pour la gaufre de silicium personnalisée Usine

CMP Oxyde de cérium Poussière de lisier de polissage des terres rares Pour la gaufre de silicium personnalisée

Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO₂) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit

Qualité Pâte de poudre de polissage à base d'oxyde de cérium blanc de terres rares pour les substrats de cristaux photoniques Usine

Pâte de poudre de polissage à base d'oxyde de cérium blanc de terres rares pour les substrats de cristaux photoniques

Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent surface quality and dimensional accuracy required in photonic crystal structures, this product enables controlled material removal while preserving delicate micro- and nano-scale

Qualité Ceria CMP sans rayures Slurry pour le polissage des plaquettes de semi-conducteurs et de silicium Usine

Ceria CMP sans rayures Slurry pour le polissage des plaquettes de semi-conducteurs et de silicium

Scratch-Free Ceria CMP Slurry for Semiconductor & Silicon Wafer Polishing Product Overview Scratch-Free Cerium Oxide CMP Slurry is specially formulated for semiconductor wafer and advanced substrate polishing where defect control and ultra-smooth surfaces are critical. The engineered nano-scale ceria particles provide superior defect reduction while maintaining stable removal efficiency. Ideal for silicon wafer finishing and precision semiconductor fabrication processes. Key

Qualité Panel LCD sous nanomètre pour polissage chimique mécanique personnalisé Usine

Panel LCD sous nanomètre pour polissage chimique mécanique personnalisé

Customized Polishing Slurry for LCD Panel Manufacturing Description Engineered for the stringent demands of display technologies, our customized cerium oxide slurries provide the high-precision finishing required for high-generation LCD and liquid crystal glass substrates. As automotive and consumer electronics move toward ultra-thin and curved profiles, our slurries deliver the sub-nanometer flatness and surface integrity essential for uniform light transmission. Core

Qualité Slurry de polissage de céréa sans rayures pour composants optiques de précision Usine

Slurry de polissage de céréa sans rayures pour composants optiques de précision

Scratch Free Ceria Polishing Slurry for Precision Optical Components Product Overview Scratch free ceria polishing slurry engineered for ultra-precision optical polishing applications. Provides excellent surface finish, minimized micro-scratches, and superior polishing consistency for optical lenses, prisms, and photonic components. Key Features Ultra-low scratch polishing performance High surface finish quality and clarity Narrow particle size distribution Excellent