High-Purity Cerium Oxide Polishing Powder for Precision Optical Components
Détails de produit
| Pureté: | ≥99,9% | D50: | 0,8 – 1,2 μm |
|---|---|---|---|
| Distribution de dimension particulaire: | Étroit | pH (suspension à 15 %): | 6,5 – 8,5 |
| Apparence: | Poudre jaune clair | Stabilité de la dispersion: | Haut |
| Mettre en évidence |
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Description de produit
High-Purity Cerium Oxide Polishing Powder for Precision Optical Components
Product Overview
High-Purity Cerium Oxide Polishing Powder is engineered for ultra-precision surface finishing of advanced optical components. Designed for high surface quality requirements, this polishing agent delivers excellent chemical-mechanical interaction, enabling superior defect control, high polishing efficiency, and stable performance in demanding optical manufacturing environments.
The product is suitable for batch and automated polishing systems used in modern optical fabrication.
Key Features
- High chemical activity for efficient material removal
- Excellent scratch-free polishing performance
- Narrow particle size distribution for surface uniformity
- Low defect generation and stable polishing behavior
- Compatible with pitch, polyurethane, and composite polishing pads
- Optimized for precision optical manufacturing processes
Particle Size Distribution
Applications
- Precision optical lenses polishing
- Camera and imaging optics
- Optical glass finishing
- Telescope optics manufacturing
- Prism and mirror polishing
- High-end photonics components
Frequently Asked Questions
Q1: What surface quality can be achieved?
Surface roughness below Ra 1 nm can be achieved depending on process conditions.
Q2: Can the powder be converted into slurry?
Yes. The powder disperses easily into deionized water to prepare customized polishing slurry.
Q3: Is it suitable for automated polishing machines?
Yes, it is optimized for both manual and CNC optical polishing systems.
Points forts du produit
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