"powder rare earth product"
高品質シュウ酸ランタン。
Lanthanum(III) Oxalate Lanthanum(III) oxalate is an oxalate salt of trivalent lanthanum and an important rare earth compound, which generally exists in the form of hydrate. 1. Basic Information Chinese Name: Lanthanum Oxalate English Name: Lanthanum(III) oxalate Chemical Formula: (decahydrate is common) Molecular Weight (Anhydrous): 541.88 CAS No.: Anhydrous: 537-03-1 Hydrate: 10344-18-0 2. Physical and Chemical Properties Appearance: White crystal or crystalline powder
無水性ディスプロシウム粉末 ネオジミウム塩化物 原材料
Anhydrous Neodymium Chloride Molecular Formula: NdCl₃Appearance: Anhydrous neodymium chloride is a pink powdery crystal. Application: Used for producing metallic neodymium, as a raw material in the field of pharmaceutical catalysis or single crystal growth. Item Specification Testing Standard Grade NdCl₃-3N NdCl₃-3N5 NdCl₃-4N / TREO (wt%) ≥66.0 ≥66.0 ≥66.0 / Rare Earth Relative Purity (wt%) Refer to GB/T 18115.1 La₂O₃/TREO ≤0.02 ≤0.01 ≤0.001 CeO₂/TREO ≤0.02 ≤0.01 ≤0.001 Pr₆O₁
低塩化セリウムランタン炭酸粉末 石油添加物
Petroleum Additives Low Chloride Lanthanum Cerium Carbonate Molecular Formula: (LaCe)₂(CO₃)₃ Appearance: Low chloride lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder Item Specification Testing Standard Item (LaCe)2(CO3)3-65CeA1 (LaCe)2(CO3)3-65CeA2 TREO(wt%) ≥45.0 ≥45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La2O3/TREO 35±2 35±2 GB/T 16484.3 CeO2 /TREO 65±2 65±2 Pr6O11 /TREO ≤0.01 ≤0.005
セリウムオキシド球状触媒粉末磨き材料
HIGH SPECIFIC SURFACE AREA CERIUM OXIDE SPHERICAL POWDER FOR CERIUM-BASED CATALYSTS Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Method Item CeO2-3N5C CeO2-4NC CeO2-4N5C CeO2-5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr6O11/TREO ≤0.01 ≤0.002 ≤0.001 ≤0.0002
高精度サファイア光学磨き粉 CAS 1306-38-3 OEM
Cerium Oxide Polishing Powder for Electronics Components Overview: Our Polishing Powder for Optical Surface Finishing is expertly designed to deliver flawless, high-precision finishes for optical components. Formulated with premium cerium oxide, this powder provides exceptional performance in polishing delicate optical surfaces, ensuring the highest levels of clarity, smoothness, and accuracy. Whether you're working with lenses, mirrors, prisms, or other optical devices, our
ホワイト CeO2 セリウムベースのグラスポーリングパウダー 0.5μm OEM
Polishing Powder For Plate Glass Description Lichen Polishing Powder for Plate Glass is a high-quality abrasive material developed for the surface finishing and defect correction of flat and plate glass. Formulated with carefully controlled particle size distribution and stable abrasive characteristics, this polishing powder delivers efficient material removal, smooth surface finish, and consistent polishing performance across large glass areas. It is widely used in
CeO2セリウム酸化物 光学磨き粉 構成物
Polishing Powder for Anti-Reflection Coating on Advanced Optics Description Optimize your thin-film performance with our High-Purity Cerium Oxide (CeO₂) Polishing Powders, specifically engineered for the precision optics market. Achieving a high-efficiency Anti-Reflection (AR) coating begins with the substrate; our powders deliver the angstrom-level surface roughness and ultra-clean topography necessary for maximum coating adhesion and minimal light scatter. As laser systems
CMP セリウム ポリッシュ 粉 玻璃 ポリッシュ ためのセリウム オキシード シリコン ウェーファー
Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle
反射防止太陽ガラス セリウムオキシド 磨き粉 材料 CAS 1306-38-3
Cerium Oxide For Finishing Anti-reflective Solar Glass Description Lichen Cerium Oxide for Finishing Anti-Reflective Solar Glass is an advanced cerium oxide-based polishing powder formulated to provide the smooth, clear, and defect-free finishes required for solar glass with anti-reflective coatings. Designed for solar panel glass polishing, this high-purity polishing powder enhances the optical performance of photovoltaic systems, ensuring optimal light transmission and
化学 機械式 平面化 CMP セリウム酸化 磨き粉 ラピダリ
Polishing Powder For Chemical Mechanical Planarization (CMP) Process Description Lichen Polishing Powder for Chemical Mechanical Planarization (CMP) is a high-performance cerium oxide-based polishing powder designed to deliver superior surface planarization and precision polishing in semiconductor wafer processing. Our polishing powder is specifically formulated to enhance material removal rates, ensuring uniformity and flatness during the CMP process, which is crucial for
OEMセリウム酸化ガラス粉 半導体フロントガラスのためのポリッシュスラリー粉
High Purity Cerium Oxide Slurry for Semiconductor Description Deliver atomic-level planarity for the most demanding 2026 semiconductor nodes with our High-Purity Cerium Oxide (Ceria) Slurries. Specifically engineered for Chemical Mechanical Planarization (CMP). Atomic-Scale Planarization: Achieve superior surface finishes with root-mean-square (RMS) roughness below 0.2 nm, essential for the ultra-fine geometries of next-generation integrated circuits. Integrated Self-Stopping
高純度セリウムオキシド 磨き粉 泥泥 サファイア時計
Cerium Oxide For Polishing High-purity Sapphire Watch Faces Description Our Cerium Oxide for Polishing High-purity Sapphire Watch Faces is specially formulated for the precise polishing of high-purity sapphire, commonly used in luxury watch faces, lenses, and optical components. This high-performance cerium oxide delivers exceptional polishing efficiency, ensuring a flawless, scratch-free finish while maintaining the integrity of the sapphire surface. It is ideal for
