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1.0μM 광학 산업용 희토류 가루 PH 중립
Polishing Powder for Photonics Industry Description Our Polishing Powder for the Photonics Industry is specially engineered to meet the demanding requirements of optical and photonic component fabrication. Designed for precision polishing, this high-performance powder is ideal for lenses, mirrors, ...
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스크래치 감축 유리 닦기 페이스트 파우더 3 미크론 세리움 산화물 기반
Scratch-reduction Polishing Powder For Smartphone Cover GlassDescriptionLichen Scratch-Reduction Polishing Powder for Smartphone Cover Glass is a high-performance cerium oxide-based powder designed to deliver smooth, scratch-free finishes on smartphone cover glass. Whether you're working with ...
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특화된 희토류 닦기 분말 세리움 산화 닦기 화합물 자동차 유리
Custom Polishing Powder For Automotive GlassDescriptionLichen Custom Polishing Powder for Automotive Glass offers tailored polishing solutions specifically designed for the diverse needs of the automotive glass industry. Whether you’re working on windshields, side windows, mirrors, or headlight ...
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유리 닦기용 초세리움 산화물 대용품 물 기반 슬러리 안개 제거기
Cerium Oxide Slurry For Display Cover Glass Description Lichen Cerium Oxide Slurry for Display Cover Glass is a high-purity, water-based slurry formulated for the precision polishing of display cover glass. Specifically designed for use in the manufacturing of smartphone screens, tablet covers, and ...
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화이트 세리움 산화물 희토류 가루 가루 페스트 포토닉 크리스탈 기판
Cerium Oxide Polishing Powder For Photonic Crystal Substrates Description Lichen Cerium Oxide Polishing Powder for Photonic Crystal Substrates is a high-purity cerium-based polishing material engineered for the ultra-fine finishing of photonic crystal substrates. Designed to support the stringent ...
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0스마트폰 태블릿용.2μM 세리움 산화물 유리 닦기 분말
Cerium Oxide Polishing Powder For Cover Glass Finishing Description Lichen Cerium Oxide Polishing Powder for Cover Glass Finishing is a high-purity, fine-particle polishing material specifically engineered for the final finishing of cover glass used in consumer electronics and automotive display ...
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MRR CeO2 정면 롤링 파우더
Polishing Powder for Integrated Circuit Fabrication Description Enable the next generation of semiconductor performance with ourSeries Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for Chemical Mechanical Planarization (CMP) within IC fabrication, our powders are optimized for nodes...
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스크래치 제거제 CeO2 세리움 산화물 닦기 화합물
Polishing Powder for Ultra-Clear LCD Panels Description Deliver the uncompromising transparency and vivid detail that high-performance displays demand with our Ultra-Clear Series Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for the next generation of 8K and high-transmittance LCD ...
