Jakość 0.2μM Semiconductor Wafer Cerium Oxide Polishing Powder Rubbing Compound Custom Fabryka
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Jakość 0.2μM Semiconductor Wafer Cerium Oxide Polishing Powder Rubbing Compound Custom Fabryka
Jakość 0.2μM Semiconductor Wafer Cerium Oxide Polishing Powder Rubbing Compound Custom Fabryka
>

0.2μM Semiconductor Wafer Cerium Oxide Polishing Powder Rubbing Compound Custom

Nazwa marki: LICHEN
Numer modelu: LCR0315
Miejsce pochodzenia: Chiny
Certyfikacja: ISO9001
Minimalna ilość zamówienia: 20 KGS
Cena £: NEGOCIABLE
Zdolność do zaopatrzenia: 250MT/MIESIĄC

Szczegóły produktu


Rozmiar cząstek: 1,5 ± 0,2 μm Nr CAS: 1306-38-3
CEO₂: 99% Stopień zawieszenia: Wysoki
Zakres pH: 7-10 Aplikacja: Płytki półprzewodnikowe
Podkreślić

0.2μm Cerium Oxide Polishing Powder

,

custom Cerium Oxide Polishing Powder

,

custom cerium oxide rubbing compound

Opis produktu

Custom Polishing Powder for High-Purity Semiconductor Wafers

Description

Lichen Custom Polishing Powder for High-Purity Semiconductor Wafers is an advanced cerium oxide-based polishing powder, specifically designed to meet the demanding requirements of high-purity semiconductor wafer manufacturing. Our polishing powder provides exceptional control over material removal, ensuring uniform surface finishes and defect-free surfaces that are critical for advanced semiconductor devices.

Designed for use in front-end and back-end processing, this slurry can be tailored to optimize polishing parameters based on your specific wafer types, device applications, and manufacturing requirements. Whether you are polishing silicon wafers, GaAs wafers, or other semiconductor materials, Lichen’s custom polishing powder ensures superior wafer quality and consistent polishing results, enhancing both yield and performance in semiconductor production.

 
Key Features & Advantages

Custom Formulations for High-Purity Wafers
Our polishing powder can be customized to suit the specific needs of high-purity semiconductor wafers used in the manufacture of integrated circuits, LEDs, and MEMS devices. The slurry can be formulated for specific material removal rates, surface flatness, and defect reduction.

High-Purity Cerium Oxide
Made from ultra-pure cerium oxide, Lichen’s polishing powder ensures that the wafer surface is polished without introducing contaminants or defects. The purity of the cerium oxide ensures the highest standards of semiconductor quality, which is crucial for advanced device fabrication.

Enhanced Surface Finish
The slurry is designed to provide high flatness, low roughness, and excellent surface uniformity, ensuring that your semiconductor wafers are ready for the most demanding processes, such as photolithography, CMP (chemical mechanical planarization), and thin-film deposition.

Precise Material Removal
Designed for precision, the slurry offers controlled material removal that ensures minimal surface defects and micro-cracking, which are essential for maintaining wafer integrity during subsequent processing steps.

Scalable & Cost-Effective
Whether you are processing single wafers or large volumes of wafers, Lichen’s slurry is optimized for use in both manual and automated polishing systems, delivering consistent results across high-throughput production environments.

 
Tech Data

Molecular FormulaCAS No.CeO₂ % D50 (μm)AppearanceApplication
CeO21306-38-399%1.5±0.2μmWhite PowderSemiconductor Wafers

 
Particle Size Distribution
 
0.2μM Semiconductor Wafer Cerium Oxide Polishing Powder Rubbing Compound Custom 0
Q&A

1. What is rare earth polishing powder?

Rare earth polishing powder is a high-purity compound used for polishing optical components, semiconductor wafers, and delicate surfaces like glass and lenses. It delivers a smooth, high-clarity finish without damaging the material.

2. How do I choose the right rare earth polishing powder for my application?

To select the ideal polishing powder, consider factors like the material you’re polishing, the required finish, and specifications like particle size and purity. Our sales team is available to help you choose the perfect product for your needs.

3. How should I store  rare earth polishing powder?

Store in a cool, dry place, away from moisture and direct sunlight. Keep the powder in airtight containers to prevent contamination and maintain its effectiveness. With proper storage, it typically lasts 1-2 years.

4. Do you provide customized rare earth formulations?

Yes, we offer custom rare earth polishing powders and slurries, tailored to meet your specific needs, including adjustments to particle size, chemical composition, or slurry consistency.

5. Can I get a sample before making a bulk order?

Absolutely! We provide samples for evaluation. Contact our team to request a sample, and we’ll arrange the shipment.

6. How can I place an order? What is the typical delivery time?

To place an order, simply contact our sales team, who will guide you through the process and provide a quote. Delivery times vary based on order size, location, and stock availability, and we’ll give you an estimated schedule once the order is confirmed.

Najważniejsze cechy produktu

Custom Polishing Powder for High-Purity Semiconductor WafersDescriptionLichen Custom Polishing Powder for High-Purity Semiconductor Wafers is an advanced cerium oxide-based polishing powder, specifically designed to meet the demanding requirements of high-purity semiconductor wafer manufacturing. ...

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