CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
Szczegóły produktu
| Czystość: | 99,99% | Szybkość usuwania: | Sterowanie z dużą precyzją |
|---|---|---|---|
| Mediana wielkości cząstek: | 0,2 – 0,3 μm | Stabilność dyspersji: | Doskonały |
| Wygląd: | Jasnożółty drobny proszek | Poziom zanieczyszczenia: | bardzo niski |
| Podkreślić |
CMP-grade ceria polishing powder,ceria polishing powder for AR optics,rare earth polishing powder for micro-lens |
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Opis produktu
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
Product Overview
This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems.
Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics integration.
Suitable for both slurry preparation and customized CMP processes.
Key Technical Advantages
CMP-compatible formulation
Ultra-smooth surface generation
Minimal subsurface damage
Excellent optical transmission quality
Designed for semiconductor-level optics processing
Particle Size Distribution
Applications
- Micro-lens array polishing
- Optical sensor components
- AR projection optics
- MEMS optical devices
- Photonics and laser optics
- Precision optical wafers
Why Choose Lichen as Your Global Supplier
- Dedicated ceria & alumina polishing manufacturer
- Stable rare earth raw material supply chain
- Customized particle engineering capability
- Consistent batch-to-batch quality control
- Technical support for polishing process optimization
Najważniejsze cechy produktu
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled ...
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics
Ultra-Fine Ceria Oxide Polishing Powder For Smart Wearable Cover Glass & Micro-Optics Finishing
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High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing
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Ceriumoksalantowy proszek Elementy reaktora chemicznego
Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically
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