CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
Λεπτομέρειες προιόντος
| Καθαρότητα: | 99,99% | Ποσοστό αφαίρεσης: | Ελεγχόμενη υψηλή ακρίβεια |
|---|---|---|---|
| Μέσο Μέγεθος Σωματιδίων: | 0,2 – 0,3 μm | Σταθερότητα διασποράς: | Εξοχος |
| εμφάνιση: | Ελαφριά κίτρινη λεπτή σκόνη | Επίπεδο ακαθαρσίας: | υπερβολικά χαμηλός |
| Επισημαίνω |
CMP-grade ceria polishing powder,ceria polishing powder for AR optics,rare earth polishing powder for micro-lens |
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Περιγραφή προϊόντων
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
Product Overview
This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems.
Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics integration.
Suitable for both slurry preparation and customized CMP processes.
Key Technical Advantages
CMP-compatible formulation
Ultra-smooth surface generation
Minimal subsurface damage
Excellent optical transmission quality
Designed for semiconductor-level optics processing
Particle Size Distribution
Applications
- Micro-lens array polishing
- Optical sensor components
- AR projection optics
- MEMS optical devices
- Photonics and laser optics
- Precision optical wafers
Why Choose Lichen as Your Global Supplier
- Dedicated ceria & alumina polishing manufacturer
- Stable rare earth raw material supply chain
- Customized particle engineering capability
- Consistent batch-to-batch quality control
- Technical support for polishing process optimization
Σημαντικά σημεία του προϊόντος
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled ...
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics
Ultra-Fine Ceria Oxide Polishing Powder For Smart Wearable Cover Glass & Micro-Optics Finishing
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High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing
High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing Product Overview This high-purity ceria polishing powder is specially engineered for ultra-precision polishing of AR waveguide optics, smart glasses lenses, and advanced wearable optical modules. Designed for next-generation augmented reality manufacturing, the product delivers controlled chemical-mechanical polishing (CMP) performance, achieving exceptional surface flatness and
Οξαλικό Κερίου Σκόνη Χημικό Αντιδραστήριο Στοιχεία
Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically
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