"rare earth oxide white powder"
3 Mikronluk Silikon Wafer için özel cam cilalama pasta tozu
Tailored Polishing Powder For Silicon Wafer Manufacturing Description Lichen Tailored Polishing Powder for Silicon Wafer Manufacturing is a premium cerium oxide-based powder formulated to deliver exceptional performance in the polishing of silicon wafers used in semiconductor manufacturing. Designed to meet the stringent requirements of the semiconductor industry, this powder offers unparalleled control over the material removal rate, surface flatness, and defect reduction,
Metallik LaCl3 Lanthanum klorür Petrol katalizörü için kum
THE BEST FACTORY DIRECT SALES PROFESSIONAL LANTHANUM CHLORIDE (SANDY) Lanthanum Chloride (Sandy) Molecular Formula: LaCl₃·6H₂OAppearance: Sandy crystalApplication: Used as petroleum catalyst, and also for the production of metallic lanthanum Item GradeSpecification LaCl₃-3N5A LaCl₃-4N5A LaCl₃-5NA Test Basis TREO (wt%) ≥42.0 ≥42.0 ≥42.0 Rare Earth Relative Purity (wt%) La₂O₃/TREO ≥99.95 ≥99.995 ≥99.999 Refer to GB/T 18115.1 CeO₂/TREO ≤0.01 ≤0.003 ≤0.0005 Pr₆O₁₁/TREO ≤0.01 ≤0
Yarım iletken için tasarlanmış yüksek saflıklı Nano Ceria CMP Çamur (200nm parçacık boyutu)
High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next-generation precision polishing processes demanding nanometer-level surface control. Key Features & Advantages Nano-Scale Precision Polishing The 100 nm ceria particles enable
Su bazlı CeO2 Cam kusurlarını gidermek için kimyasal mekanik cilalama çamurları
Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration
Özel Kimyasal Mekanik Polişleme CMP Çamur Alt Nanometre LCD Panel
Customized Polishing Slurry for LCD Panel Manufacturing Description Engineered for the stringent demands of display technologies, our customized cerium oxide slurries provide the high-precision finishing required for high-generation LCD and liquid crystal glass substrates. As automotive and consumer electronics move toward ultra-thin and curved profiles, our slurries deliver the sub-nanometer flatness and surface integrity essential for uniform light transmission. Core
2.2μM Ph Tarafsız Polişleme CMP Cam Wafer Substratları için Çamur
CMP Slurry For Glass Wafer Substrates Description Lichen CMP Slurry for Glass Wafer Substrates is a high-purity, ready-to-use polishing slurry formulated for precision chemical-mechanical planarization (CMP) of glass wafer substrates. Designed for the advanced semiconductor, photonics, and microelectronics industries, this slurry ensures optimal material removal, uniform surface polishing, and low defect density, meeting the strict requirements for high-performance glass
