35 Results For

"cerium rare earth metal powder"

Qualité Oxyde de cérium à haute surface pour la production de convertisseurs catalytiques automobiles Usine

Oxyde de cérium à haute surface pour la production de convertisseurs catalytiques automobiles

High Surface Area Cerium Oxide For Automotive Catalytic Converter Production Description Cerium Oxide (CeO₂) is an essential functional material used in the manufacturing of automotive catalytic converters and advanced emission control systems. Acting as an oxygen storage and redox catalyst component, cerium oxide enhances catalytic efficiency by stabilizing exhaust gas reactions under fluctuating engine operating conditions. Key Features Efficient Oxygen Storage & Release

Qualité Poudre d'acétate de cérium d'hydrate de métaux rares solides pour catalyseur Usine

Poudre d'acétate de cérium d'hydrate de métaux rares solides pour catalyseur

Cerium Acetate Molecular Formula: Ce(AC)₃·xH₂O Appearance: Cerium acetate is a white snowflake-like solid Application: Used as a raw material for other cerium salts and cerium oxide, as well as petroleum additives, etc. Item Specification Testing Standard Item Ce(AC)3-3N5 Ce(AC)3-4N Ce(AC)3-4N5 Ce(AC)3-5N TREO(wt%) ≥45 ≥45 ≥45 ≥45 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99.995 ≥99.999 Pr6O11/TREO ≤0.01 ≤0

Qualité Poudre de polissage à l'oxyde de cérium CMP pour plaquettes de verre à semi-conducteurs Usine

Poudre de polissage à l'oxyde de cérium CMP pour plaquettes de verre à semi-conducteurs

Cerium Oxide Polishing Powder for Semiconductor Wafers Description Lichen Cerium Oxide Polishing Powder for Semiconductor Wafers is a high-purity, precision-engineered abrasive designed for wafer surface finishing and planarization processes. With tightly controlled particle size distribution and low metallic impurities, this polishing powder delivers uniform material removal, excellent surface smoothness, and low defect density, supporting the stringent requirements of

Qualité Pâte de poudre de polissage au cérium personnalisée pour le polissage de gaufres à semi-conducteurs Usine

Pâte de poudre de polissage au cérium personnalisée pour le polissage de gaufres à semi-conducteurs

Polishing Powder For Ultra-Fine Wafer Polishing Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern semiconducto

Qualité CMP Cerium Polish Powder Oxyde de cérium pour le polissage du verre Wafer de silicium Usine

CMP Cerium Polish Powder Oxyde de cérium pour le polissage du verre Wafer de silicium

Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle

Qualité Slurry d'oxyde de cérium à planarisation fine pour verre semi-conducteur Usine

Slurry d'oxyde de cérium à planarisation fine pour verre semi-conducteur

Slurry For Fine Planarization Of Semiconductor Glass Description Lichen Cerium-Based Polishing Slurry for Fine Planarization of Semiconductor Glass is a high-purity, ready-to-use slurry engineered for advanced glass planarization processes in semiconductor manufacturing. Formulated with precisely controlled cerium oxide particles, this slurry delivers excellent surface flatness, low roughness, and minimal defect generation, meeting the stringent requirements of modern

Qualité Planarisation Oxyde de cérium Slurry pâte de polissage abrasif pour verre semi-conducteur Usine

Planarisation Oxyde de cérium Slurry pâte de polissage abrasif pour verre semi-conducteur

Cerium Oxide Slurry For Semiconductor Glass Substrates Description Lichen Cerium Oxide Slurry for Semiconductor Glass Substrates is a high-purity, water-based polishing slurry formulated specifically for semiconductor glass applications. This slurry provides excellent material removal rates, consistent surface finishes, and precise planarization, making it ideal for polishing semiconductor glass substrates used in wafer-level packaging, photomasks, and advanced integrated

Qualité CMP Cerium Oxide Slurry pour le polissage du verre par pré-couche Usine

CMP Cerium Oxide Slurry pour le polissage du verre par pré-couche

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

Qualité Poudre de polissage OEM Ceo2 pour pare-brise automobile Cas 1306-38-3 Usine

Poudre de polissage OEM Ceo2 pour pare-brise automobile Cas 1306-38-3

Polishing Powder For Automotive Glass And Windshields Description Lichen Cerium Oxide Polishing Powder for Automotive Glass and Windshields is a high-purity, fine-grade polishing material designed to deliver superior results in the automotive glass industry. Engineered for precision finishing, this cerium oxide polishing powder ensures high-quality surface smoothness, gloss, and clarity, making it ideal for polishing automotive glass, windshields, and other critical glass

Qualité Lumière de polissage en poudre de haute pureté Ceo2 pour écrans OLED Usine

Lumière de polissage en poudre de haute pureté Ceo2 pour écrans OLED

High Purity Polishing Slurry For OLED DisplaysDescriptionLichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability.Our slurry is ideal for polishing the glass substrates and fine

Qualité 2.2μM Ph Polissage neutre CMP Slurry pour les substrats de plaquettes de verre Usine

2.2μM Ph Polissage neutre CMP Slurry pour les substrats de plaquettes de verre

CMP Slurry For Glass Wafer Substrates Description Lichen CMP Slurry for Glass Wafer Substrates is a high-purity, ready-to-use polishing slurry formulated for precision chemical-mechanical planarization (CMP) of glass wafer substrates. Designed for the advanced semiconductor, photonics, and microelectronics industries, this slurry ensures optimal material removal, uniform surface polishing, and low defect density, meeting the strict requirements for high-performance glass

Précédent Suivant
Précédent
Page 3 de 3
Suivant