149 Results For

"powder rare earth material"

品質 紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング 工場

紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

品質 水ベースのCeO2 化学機械的な磨きスラム ガラスの欠陥除去 工場

水ベースのCeO2 化学機械的な磨きスラム ガラスの欠陥除去

Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration

品質 半導体向け高純度ナノセリアCMPスラリー(粒子径200nm) 工場

半導体向け高純度ナノセリアCMPスラリー(粒子径200nm)

High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next-generation precision polishing processes demanding nanometer-level surface control. Key Features & Advantages Nano-Scale Precision Polishing The 100 nm ceria particles enable

品質 ナノセリアCMPスラージュ 超細かいセリアオキシドスラージュ 高精度半導体と光学磨き用 工場

ナノセリアCMPスラージュ 超細かいセリアオキシドスラージュ 高精度半導体と光学磨き用

Nano Ceria CMP Slurry | Ultra-Fine Cerium Oxide Slurry For High-Precision Semiconductor & Optical Polishing Descripti on Nano Ceria CMP Slurry is a high-purity cerium oxide polishing slurry specifically developed for advanced Chemical Mechanical Planarization (CMP) applications requiring precise material removal and superior surface quality. Formulated with uniformly dispersed nano-scale ceria particles, the slurry delivers an optimal balance between chemical activity and

品質 高性能セリウムオキシドスラム 展示表面磨き用 CAS 1306-38-3 工場

高性能セリウムオキシドスラム 展示表面磨き用 CAS 1306-38-3

High-Performance Cerium Slurry for Display Surface Finishing Description Achieve uncompromising optical clarity with our Precision-Engineered Cerium Oxide (CeO₂) Slurries. Specifically formulated for the display market, our slurries provide the nanometer-level flatness and defect-free surfaces essential for high-resolution LCD, OLED, and MicroLED consumer electronics. By combining high-purity rare earth oxides with advanced chemical stabilizers, our product line ensures

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