149 Results For

"powder rare earth material"

품질 자외선 보호 금속 CMP 시리움 산화물 슬러리 공장

자외선 보호 금속 CMP 시리움 산화물 슬러리

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

품질 물 기반의 CeO2 화학적 기계적 닦기 슬러리 유리 결함 제거 공장

물 기반의 CeO2 화학적 기계적 닦기 슬러리 유리 결함 제거

Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration

품질 반도체용으로 설계된 고순도 나노 세리아 CMP 슬러리 (200nm 입자 크기) 공장

반도체용으로 설계된 고순도 나노 세리아 CMP 슬러리 (200nm 입자 크기)

High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next-generation precision polishing processes demanding nanometer-level surface control. Key Features & Advantages Nano-Scale Precision Polishing The 100 nm ceria particles enable

품질 나노 세리아 CMP 슬러리 | 고정밀 반도체 및 광학 연마용 초미세 산화세륨 슬러리 공장

나노 세리아 CMP 슬러리 | 고정밀 반도체 및 광학 연마용 초미세 산화세륨 슬러리

Nano Ceria CMP Slurry | Ultra-Fine Cerium Oxide Slurry For High-Precision Semiconductor & Optical Polishing Descripti on Nano Ceria CMP Slurry is a high-purity cerium oxide polishing slurry specifically developed for advanced Chemical Mechanical Planarization (CMP) applications requiring precise material removal and superior surface quality. Formulated with uniformly dispersed nano-scale ceria particles, the slurry delivers an optimal balance between chemical activity and

품질 디스플레이 표면 닦기용 고성능 세리움 산화물 슬러리 CAS 1306-38-3 공장

디스플레이 표면 닦기용 고성능 세리움 산화물 슬러리 CAS 1306-38-3

High-Performance Cerium Slurry for Display Surface Finishing Description Achieve uncompromising optical clarity with our Precision-Engineered Cerium Oxide (CeO₂) Slurries. Specifically formulated for the display market, our slurries provide the nanometer-level flatness and defect-free surfaces essential for high-resolution LCD, OLED, and MicroLED consumer electronics. By combining high-purity rare earth oxides with advanced chemical stabilizers, our product line ensures

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