120 Results For

"high purity cerium oxide"

품질 정밀 광학 렌즈 제조용 고순도 세리아 연마 분말 공장

정밀 광학 렌즈 제조용 고순도 세리아 연마 분말

High-Purity Ceria Polishing Powder For Precision Optical Lens Manufacturing Product Overview Our high-purity cerium oxide polishing powder is engineered for precision optical finishing applications requiring superior surface quality and defect control. Designed for modern optical production lines, this polishing compound delivers fast material removal while achieving ultra-smooth surface roughness. Ideal for manufacturers of camera optics, laser systems, and high-performance

품질 실리콘 웨이퍼 평탄화를 위한 고순도 CMP 슬러리 공장

실리콘 웨이퍼 평탄화를 위한 고순도 CMP 슬러리

High Purity CMP Slurry For Silicon Wafer Planarization Product Overview Advanced CMP slurry designed for silicon wafer polishing in semiconductor manufacturing. Delivers excellent surface planarization, low defectivity, stable removal rate, and superior wafer surface quality for IC, MEMS, and advanced electronic applications. Key Features High planarization efficiency for silicon wafers Excellent surface smoothness and low scratch performance Stable particle size distribution

품질 CeO2 세리움 산화물 롤러 랩다리 슬러리 패스트 LCD 패널 공장

CeO2 세리움 산화물 롤러 랩다리 슬러리 패스트 LCD 패널

Polishing Slurry for LCD Panel Manufacturing Description Maximize your display yield with our precision-engineered Cerium Oxide (CeO₂) Polishing Slurries. Specifically formulated for high-generation LCD manufacturing standards, our slurries provide the nanometer-level flatness and defect-free surfaces essential for high-resolution, high-transmittance display panels. Our product line features advanced suspension stability and high-purity formulations designed to handle the

품질 터치 스크린 유리 희토류 가루 가루 세리움 산화물 CMP 사용자 정의 공장

터치 스크린 유리 희토류 가루 가루 세리움 산화물 CMP 사용자 정의

Polishing Slurry for Touchscreen Glass PolishingDescriptionDeliver the flawless, ultra-clear finish that modern mobile and interactive displays demand with our Cerium-Based Polishing Slurries. Specifically engineered for high-strength cover glasses, our slurries combine precision-graded cerium oxide with advanced chemical additives to achieve sub-nanometer surface roughness and exceptional optical clarity. Key Performance AdvantagesOptimized for Chemically Strengthened Glass:

품질 반도체 등급의 웨이퍼 및 첨단 기판용 세리움 산화물 닦기 분말 공장

반도체 등급의 웨이퍼 및 첨단 기판용 세리움 산화물 닦기 분말

Semiconductor Grade Cerium Oxide Polishing Powder for Wafer & Advanced Substrates Product Overview Semiconductor Grade Cerium Oxide Polishing Powder is formulated for defect-sensitive polishing applications in semiconductor and advanced electronic substrate manufacturing. The controlled purity and particle engineering reduce contamination risks while ensuring consistent planarization performance. Optimized for preparation of CMP slurries used in semiconductor wafer processing

품질 산업용 희토류 화합물 세리움 산화물 Ceo2 유리 닦기 분말 공장

산업용 희토류 화합물 세리움 산화물 Ceo2 유리 닦기 분말

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 -4N5C CeO 2 -5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO 2 /TREO ≥99.95 ≥99.99 ≥99.995 ≥99

품질 산업용 희토류 화합물 세리움 산화물 Ceo2 유리 닦기 분말 공장

산업용 희토류 화합물 세리움 산화물 Ceo2 유리 닦기 분말

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 -4N5C CeO 2 -5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO 2 /TREO ≥99.95 ≥99.99 ≥99.995 ≥99

품질 산업용 희토류 화합물 세리움 산화물 Ceo2 유리 닦기 분말의 경쟁 가격 공장

산업용 희토류 화합물 세리움 산화물 Ceo2 유리 닦기 분말의 경쟁 가격

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 -4N5C CeO 2 -5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO 2 /TREO ≥99.95 ≥99.99 ≥99.995 ≥99

품질 高品质工业级稀土化合物氧化铈 CeO2 玻璃抛光粉 공장

高品质工业级稀土化合物氧化铈 CeO2 玻璃抛光粉

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO₂ Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 -4N5C CeO 2 -5NC TREO(wt%) ≥99.0 ≥99.0 ≥99.0 ≥99.0 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO 2 /TREO ≥99.95 ≥99.99 ≥99.995 ≥99

품질 CMP 세리움 폴러드 세리움 산화물 유리 닦기 위해 실리콘 웨이퍼 공장

CMP 세리움 폴러드 세리움 산화물 유리 닦기 위해 실리콘 웨이퍼

Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO₂) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle

품질 삼원 촉매용 산화세륨(CeO₂) | 자동차 배출가스 제어 촉매 재료 공장

삼원 촉매용 산화세륨(CeO₂) | 자동차 배출가스 제어 촉매 재료

Cerium Oxide (CeO₂) For Three-Way Catalysts | Automotive Emission Control Catalyst Material Description Cerium Oxide (CeO₂) is a critical rare earth material widely used as an oxygen storage and release component in automotive catalytic converters. It plays a central role in Three-Way Catalyst (TWC) systems by improving catalytic efficiency and enabling effective control of vehicle exhaust emissions. Through its unique reversible redox behavior between Ce⁴⁺ and Ce³⁺ states,

품질 스크래치 제거제 CeO2 세리움 산화물 닦기 화합물 공장

스크래치 제거제 CeO2 세리움 산화물 닦기 화합물

Polishing Powder for Ultra-Clear LCD Panels Description Deliver the uncompromising transparency and vivid detail that high-performance displays demand with our Ultra-Clear Series Cerium Oxide (CeO₂) Polishing Powders. Engineered specifically for the next generation of 8K and high-transmittance LCD panels, these powders utilize advanced Chemical-Mechanical Polishing (CMP) to achieve the atomic-level surface perfection required for zero-defect viewing. As display manufacturers