Semiconductor Polishing Ceo2 Oxide Slurry High Precision 1.0μm
Product Details
| Particle Size: | 1.0±0.2μm | CAS No.: | 1306-38-3 |
|---|---|---|---|
| CeO₂: | 99% | Suspension Rate: | High |
| PH Range: | 7-10 | Formulation: | Customized |
| Highlight |
Polishing oxide slurry,1.0μm oxide slurry,Polishing ceo2 slurry |
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Product Description
Polishing Slurry for High-Precision Semiconductor Manufacturing
Overview:
Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in wafer surface finishing, ensuring ultra-smooth surfaces essential for next-generation semiconductor devices.
Key Features:
High Purity Cerium Oxide: Utilizes advanced cerium oxide technology to provide exceptional polishing efficiency and fine surface finishes.
Superior Removal Rate: Optimized for precision material removal with minimal surface defects, making it ideal for advanced semiconductor wafer applications.
Versatile Application: Designed for a wide range of semiconductor materials, including silicon, gallium arsenide (GaAs), and other compound semiconductors.
Low Contamination: Reduced levels of ionic contamination, ensuring high purity and compatibility with semiconductor fabrication processes.
Consistent Quality: Manufactured under strict quality control standards, ensuring uniform dispersion and consistency for every batch.
Tech Data
| Molecular Formula | CAS No. | CeO₂ % | D50 (μm) | Appearance | Application |
| CeO2 | 1306-38-3 | 99% | 1.0±0.2 | White Slurry | Semiconductor |
Q&A
1. What is rare earth polishing powder?
Rare earth polishing powder is a high-purity compound used for polishing optical components, semiconductor wafers, and delicate surfaces like glass and lenses. It delivers a smooth, high-clarity finish without damaging the material.
2. How do I choose the right rare earth polishing powder for my application?
To select the ideal polishing powder, consider factors like the material you’re polishing, the required finish, and specifications like particle size and purity. Our sales team is available to help you choose the perfect product for your needs.
3. How should I store rare earth polishing powder?
Store in a cool, dry place, away from moisture and direct sunlight. Keep the powder in airtight containers to prevent contamination and maintain its effectiveness. With proper storage, it typically lasts 1-2 years.
4. Do you provide customized rare earth formulations?
Yes, we offer custom rare earth polishing powders and slurries, tailored to meet your specific needs, including adjustments to particle size, chemical composition, or slurry consistency.
5. Can I get a sample before making a bulk order?
Absolutely! We provide samples for evaluation. Contact our team to request a sample, and we’ll arrange the shipment.
6. How can I place an order? What is the typical delivery time?
To place an order, simply contact our sales team, who will guide you through the process and provide a quote. Delivery times vary based on order size, location, and stock availability, and we’ll give you an estimated schedule once the order is confirmed.
Product Highlights
Polishing Slurry for High-Precision Semiconductor Manufacturing Overview: Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in ...
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Cerium Oxalate Powder Chemical Reagent Elements
Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically
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