Aluminum Oxide Polishing Slurry | High-Purity Alumina Slurry For Precision Optics, Metal & Semiconductor Polishing
Product Details
| Particle Size (D50): | 1.8–2.4μm | Solid Content: | 17–22wt% |
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| PH Value: | 3-4 | Dispersion Stability: | Excellent |
| Appearance: | White Suspension | Agglomeration: | Extremely Low |
| Highlight |
aluminum oxide polishing slurry for optics,high-purity alumina slurry for metal polishing,alumina slurry for semiconductor polishing |
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Product Description
Aluminum Oxide Polishing Slurry | High-Purity Alumina Slurry For Precision Optics, Metal & Semiconductor Polishing
Description
Aluminum Oxide Polishing Slurry (Al₂O₃) is a high-performance abrasive suspension engineered for precision surface finishing and chemical mechanical polishing (CMP) applications. Formulated with high-purity alumina particles and advanced dispersion technology, the slurry delivers stable polishing performance, consistent material removal, and excellent surface quality across a wide range of materials.
The optimized particle morphology and controlled particle size distribution enable efficient polishing while minimizing scratches and surface defects. The slurry is suitable for both fine polishing and intermediate polishing processes requiring high dimensional accuracy and smooth surface finishes.
Designed for industrial production environments, the aluminum oxide polishing slurry offers reliable process stability, long-term dispersion uniformity, and compatibility with automated polishing systems.
Key Features & Advantages
High Material Removal Efficiency
Alumina particles provide strong mechanical polishing capability, enabling efficient removal of surface irregularities and machining marks.
Excellent Surface Finish
Optimized particle engineering minimizes scratches and achieves smooth, uniform surfaces suitable for high-precision applications.
Technical Advantages of Alumina Polishing Slurry
Aluminum oxide is widely used due to its:
High hardness and cutting efficiency
- Excellent wear resistance
- Stable chemical properties
- Cost-effective polishing performance
Compared with softer abrasives, alumina slurry provides faster material removal while maintaining good surface quality.
Product Highlights
Aluminum Oxide Polishing Slurry | High-Purity Alumina Slurry For Precision Optics, Metal & Semiconductor Polishing Description Aluminum Oxide Polishing Slurry (Al₂O₃) is a high-performance abrasive suspension engineered for precision surface finishing and chemical mechanical polishing (CMP) ...
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Cerium Oxalate Powder Chemical Reagent Elements
Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically
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