CMP-Grade Ceria Polishing Powder For Optical Glass & Photonics Manufacturing
Product Details
| Purity: | 99.5 – 99.9% | Particle Size Distribution: | Narrow PSD |
|---|---|---|---|
| Median Particle Size: | 0.5 – 0.9 μm | PH (Slurry Preparation): | 6.5 – 7.5 |
| Sedimentation Stability: | Excellent | Impurity Level: | Ultra-Low |
| Highlight |
Ceria polishing powder for optical glass,Rare earth polishing powder for photonics,CMP-grade ceria powder with warranty |
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Product Description
CMP-Grade Ceria Polishing Powder For Optical Glass & Photonics Manufacturing
Product Overview
This CMP-grade ceria polishing powder is optimized for chemical-mechanical polishing processes used in advanced optical and photonics manufacturing. The balanced chemical activity and mechanical action enable excellent scratch control and uniform polishing across large substrates.
Developed for automated polishing systems widely used in U.S. optical fabrication facilities.
Particle Size Distribution
Applications
- Optical glass substrates
- Photonic wafers
- Fiber optic connectors
- Infrared optical components
- AR/VR optical elements
Why Choose Lichen as Your Global Supplier
- Dedicated ceria & alumina polishing manufacturer
- Stable rare earth raw material supply chain
- Customized particle engineering capability
- Consistent batch-to-batch quality control
- Technical support for polishing process optimization
Product Highlights
CMP-Grade Ceria Polishing Powder For Optical Glass & Photonics Manufacturing Product Overview This CMP-grade ceria polishing powder is optimized for chemical-mechanical polishing processes used in advanced optical and photonics manufacturing. The balanced chemical activity and mechanical action ...
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