High-Removal-Rate Cerium Oxide Polishing Powder for Optical Manufacturing Efficiency
รายละเอียดสินค้า
| ความบริสุทธิ์: | ≥ 99.95% | D50: | 1.5 – 2.5 ไมโครเมตร |
|---|---|---|---|
| ความเข้ากันได้: | พื้นผิวแก้วและแสง | เนื้อหาที่เป็นของแข็งที่แนะนำ: | สารละลาย 5 – 15 % โดยน้ำหนัก |
| รูปร่าง: | ผงสีเหลืองอ่อน | ความเสถียรในการกระจายตัว: | สูง |
| เน้น |
cerium oxide polishing powder for optics,high-removal-rate polishing powder,rare earth optical polishing powder |
||
คําอธิบายสินค้า
High-Removal-Rate Cerium Oxide Polishing Powder for Optical Manufacturing Efficiency
Product Overview
High-Removal-Rate Cerium Oxide Polishing Powder is designed for production environments requiring high throughput without sacrificing optical surface quality. The optimized particle structure enhances polishing efficiency while maintaining controlled surface finishing performance.
It supports cost-effective large-scale optical component manufacturing.
Key Features
- High material removal rate (MRR)
- Excellent balance between speed and surface finish
- Reduced polishing cycle time
- Stable suspension behavior
- Suitable for continuous industrial polishing lines
- Improved process productivity
Particle Size Distribution
Applications
- Mass production optical lenses
- Flat optical glass polishing
- Display and photonics substrates
- Optical window manufacturing
- Industrial optics production lines
Frequently Asked Questions
Q1: What surface quality can be achieved?
Surface roughness below Ra 1 nm can be achieved depending on process conditions.
Q2: Can the powder be converted into slurry?
Yes. The powder disperses easily into deionized water to prepare customized polishing slurry.
Q3: Is it suitable for automated polishing machines?
Yes, it is optimized for both manual and CNC optical polishing systems.
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