110 Results For

"cerium oxide polishing compound"

Quality Cerium Oxalate Powder Chemical Reagent Elements factory

Cerium Oxalate Powder Chemical Reagent Elements

Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically

Quality Rare Earth Compound Yttrium Oxide Powder. factory

Rare Earth Compound Yttrium Oxide Powder.

Factory Supply High Quality Yttrium Oxide Powder Product Description Product Name Yttrium oxide MF O3Y2 EINECS 215-233-5 Appearance white powder MOQ 1 kg, please consult for details Sample And Customize Support Delivery Time 7-15 days Shipping Method sea freight,land transport,air transport,express delivery Package standard packaging Payment Method ALL Place of Origin Inner Mongolia, China Brand As per customers demand Production Capacity 4000 tons/year Quality Top Quality

Quality 1.0μM Rare Earth Polishing Powder For Photonics Industry PH Neutral factory

1.0μM Rare Earth Polishing Powder For Photonics Industry PH Neutral

Polishing Powder for Photonics Industry Description Our Polishing Powder for the Photonics Industry is specially engineered to meet the demanding requirements of optical and photonic component fabrication. Designed for precision polishing, this high-performance powder is ideal for lenses, mirrors, prisms, optical fibers, and waveguides used in cutting-edge photonic applications. Key Features: Exceptional Purity: Manufactured with the highest-quality materials, our polishing

Quality Tailored Glass Optical Polishing Powder For Photonics Industry factory

Tailored Glass Optical Polishing Powder For Photonics Industry

Tailored Polishing Powder for Photonics Industry Description Elevate your photonics manufacturing with our ultra-high purity, tailored cerium oxide (CeO) polishing powders. Engineered specifically for the rigorous demands of precision photonics and fiber optics. As photonics systems move toward higher speeds and complex freeform geometries, our tailored powders provide the stability and precision necessary to minimize signal loss and maximize device efficiency. Key Features

Quality Cerium Based Rare Earth Polishing Powder Materials For Flat Glass Processing Cas 1306 38 3 factory

Cerium Based Rare Earth Polishing Powder Materials For Flat Glass Processing Cas 1306 38 3

Polishing Materials For Flat Glass Processing Description Lichen Cerium-Based Polishing Materials for Flat Glass Processing are specially formulated abrasives designed to meet the stringent demands of the flat glass industry. Whether for architectural glass, automotive glass, or glass for electronics, our high-purity cerium oxide materials deliver exceptional polishing results, ensuring high-quality finishes with low surface roughness and minimal defects. Our products are

Quality High Precision Sapphire Optical Polishing Powder Cas 1306-38-3 OEM factory

High Precision Sapphire Optical Polishing Powder Cas 1306-38-3 OEM

Cerium Oxide Polishing Powder for Electronics Components Overview: Our Polishing Powder for Optical Surface Finishing is expertly designed to deliver flawless, high-precision finishes for optical components. Formulated with premium cerium oxide, this powder provides exceptional performance in polishing delicate optical surfaces, ensuring the highest levels of clarity, smoothness, and accuracy. Whether you're working with lenses, mirrors, prisms, or other optical devices, our

Quality Industrial Lapping Rare Earth Polishing Slurry For Crystal Glass Polishing factory

Industrial Lapping Rare Earth Polishing Slurry For Crystal Glass Polishing

Industrial Abrasives For Crystal Glass Polishing Description Lichen Industrial Abrasives for Crystal Glass Polishing are specially formulated cerium oxide-based abrasives designed for high-precision polishing of crystal glass surfaces. Whether polishing fine crystal glassware, decorative glass, or optical crystal, our abrasives ensure a flawless, high-clarity finish that meets the highest standards of optical quality and aesthetic appeal. Lichen's abrasives are formulated to

Quality Competitive Price &High Purity Cerium Hydroxide Rare Earth Powder Raw Material factory

Competitive Price &High Purity Cerium Hydroxide Rare Earth Powder Raw Material

Competitive Price &High Purity Cerium Hydroxide Rare Earth Powder Raw Material Cerium(IV) Hydroxide Cerium(IV) hydroxide, usually referring to tetravalent cerium hydroxide, is an important rare earth compound with the chemical formula Ce(OH) . 1. Basic Information CAS No.: 12014-56-1 Molecular Weight: 208.15 Synonyms: Ceric hydroxide, hydrated cerium dioxide 2. Physical and Chemical Properties Appearance: Amorphous powder in light yellow, brownish yellow or off-white

Quality Semiconductor CeO2 Ceria Slurry Cerium Based Glass Polishing Powder factory

Semiconductor CeO2 Ceria Slurry Cerium Based Glass Polishing Powder

Custom Polishing Powder for High-Purity Semiconductor Wafers Description Lichen Polishing Powder for Ultra-Flat Semiconductor Surface Finishing is a high-performance cerium oxide-based polishing powder designed to achieve exceptionally flat and smooth surfaces required for advanced semiconductor manufacturing. Whether polishing silicon wafers or compound semiconductors, our powder ensures ultra-flat surfaces with low roughness and uniform thickness, making it ideal for high

Quality Semiconductor Polishing Ceo2 Oxide Slurry High Precision 1.0μm factory

Semiconductor Polishing Ceo2 Oxide Slurry High Precision 1.0μm

Polishing Slurry for High-Precision Semiconductor Manufacturing Overview: Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in wafer surface finishing, ensuring ultra-smooth surfaces essential for next-generation semiconductor devices. Key Features: High Purity Cerium Oxide: Utilizes advanced cerium oxide

Quality Scratch-Free Ceria CMP Slurry for Semiconductor & Silicon Wafer Polishing factory

Scratch-Free Ceria CMP Slurry for Semiconductor & Silicon Wafer Polishing

Scratch-Free Ceria CMP Slurry for Semiconductor & Silicon Wafer Polishing Product Overview Scratch-Free Cerium Oxide CMP Slurry is specially formulated for semiconductor wafer and advanced substrate polishing where defect control and ultra-smooth surfaces are critical. The engineered nano-scale ceria particles provide superior defect reduction while maintaining stable removal efficiency. Ideal for silicon wafer finishing and precision semiconductor fabrication processes. Key

Quality High Purity Polishing Ceo2 Powder Slurry For OLED Displays factory

High Purity Polishing Ceo2 Powder Slurry For OLED Displays

High Purity Polishing Slurry For OLED DisplaysDescriptionLichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability.Our slurry is ideal for polishing the glass substrates and fine