116 Results For

"high purity cerium powder"

0.8μM Cerium Oxide Rare Earth Polishing Slurry Abrasive For Polishing Infrared IR Optics

Cerium Oxide For Polishing High-index Infrared (IR) Optics Description Lichen Cerium Oxide for Polishing High-Index Infrared (IR) Optics is a high-purity ceria-based polishing material engineered for the precision finishing of high-index IR optical components. Leveraging cerium oxides unique chemicalmechanical polishing characteristics, this product delivers efficient material removal, low surface roughness, and excellent surface uniformity on demanding IR substrates.

CMP Cerium Polish Powder Cerium Oxide For Glass Polishing Silicon Wafer

Polishing Powder for Silicon Wafer CMP Description Achieve the extreme planarity required for semiconductor nodes with our Advanced Cerium Oxide (CeO) Polishing Powders. Specifically engineered for Chemical Mechanical Planarization (CMP), our powders are designed for the high-volume manufacturing of silicon wafers, delivering the atomic-level smoothness essential for sub-7nm logic and 3D NAND memory architectures. Our formulations utilize precisely controlled particle

Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

FACTORY PRICE INDUSTRIAL GRADE CERIUM OXIDE POWDER CAS NO 1306-38-3 CEO2 HIGH PURITY 99.99% GLASS POLISHING POWDER Cerium Oxide Molecular Formula: CeO Appearance: Light yellow powder Uses: Used as polishing material or as a catalyst. Item Specifications Test Basis Item CeO 2 -3N5C CeO 2 -4NC CeO 2 -4N5C CeO 2 -5NC TREO(wt%) 99.0 99.0 99.0 99.0 Rare Earth Relative Purity (wt%) La 2 O 3 /TREO 0.01 0.005 0.003 0.0004 GB/T 18115.2 CeO 2 /TREO 99.95 99.99 99.995 99

High Quality Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

Competitive price for Industrial Grade Rare Earth Compound Cerium Oxide Ceo2 Glass Polishing Powder

Nano Ceria CMP Slurry | Ultra-Fine Cerium Oxide Slurry For High-Precision Semiconductor & Optical Polishing

Nano Ceria CMP Slurry | Ultra-Fine Cerium Oxide Slurry For High-Precision Semiconductor & Optical Polishing Descripti on Nano Ceria CMP Slurry is a high-purity cerium oxide polishing slurry specifically developed for advanced Chemical Mechanical Planarization (CMP) applications requiring precise material removal and superior surface quality. Formulated with uniformly dispersed nano-scale ceria particles, the slurry delivers an optimal balance between chemical activity and

Scratch Remover CeO2 Cerium Oxide Polishing Compound For Ultra Clear LCD Panels

Polishing Powder for Ultra-Clear LCD Panels Description Deliver the uncompromising transparency and vivid detail that high-performance displays demand with our Ultra-Clear Series Cerium Oxide (CeO) Polishing Powders. Engineered specifically for the next generation of 8K and high-transmittance LCD panels, these powders utilize advanced Chemical-Mechanical Polishing (CMP) to achieve the atomic-level surface perfection required for zero-defect viewing. As display manufacturers

CMP Cerium Oxide Rare Earth Polishing Slurry Powder For Silicon Wafer Custom

Cerium Oxide CMP Polishing Slurry for Silicon Wafer Description Achieve atomic-level planarity and superior device yields with our Series Cerium Oxide (CeO) CMP Slurries. Specifically engineered for the most demanding Chemical Mechanical Planarization (CMP) processes in semiconductor fabrication. In 2026, as wafer geometries become increasingly complex, our ceria-based formulations provide the high selectivity and ultra-low defectivity. Performance Excellence High Selectivit

White CeO2 Cerium Based Glass Polishing Powder 0.5μm OEM

Polishing Powder For Plate Glass Description Lichen Polishing Powder for Plate Glass is a high-quality abrasive material developed for the surface finishing and defect correction of flat and plate glass. Formulated with carefully controlled particle size distribution and stable abrasive characteristics, this polishing powder delivers efficient material removal, smooth surface finish, and consistent polishing performance across large glass areas. It is widely used in

Polishing Optical Glass Scratch Remover Powder Cerium Oxide For Windshield

Polishing Powder for Optical Glass Manufacturing Description Lichen Polishing Powder for Optical Glass Manufacturing is a premium-grade optical polishing material engineered to deliver consistent material removal, excellent surface smoothness, and stable process performance across a wide range of optical glass types. Formulated using high-purity abrasives with controlled particle size distribution, this polishing powder supports the demanding requirements of precision optics

OEM CMP Polishing Cerium Oxide Slurry Abrasive For Laser Optics Semiconductor

Customized Polishing Slurry for Laser Optics Description Achieve pristine, defect-free optical surfaces with our advanced, customized cerium-based polishing slurries, specifically engineered for the demanding requirements of high-performance laser optics. Our formulations utilize high-purity cerium oxide (CeO) as the primary abrasive, leveraging its unique chemical-mechanical polishing (CMP) properties to deliver exceptional surface finishes, increased productivity, and

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