OEM CMP Polishing Cerium Oxide Slurry Abrasive For Laser Optics Semiconductor
Product Details
| Particle Size D50 (μm): | 0.6-0.8µm | CAS No.: | 1306-38-3 |
|---|---|---|---|
| CeO₂ % : | 73~78% | Suspension: | Excellent |
| PH Range: | 7-10 | Formulation: | Customized |
| Highlight |
cerium oxide slurry abrasive,CMP cerium oxide slurry,Cerium semiconductor slurry |
||
Product Description
Customized Polishing Slurry for Laser Optics
Description
Achieve pristine, defect-free optical surfaces with our advanced, customized cerium-based polishing slurries, specifically engineered for the demanding requirements of high-performance laser optics.
Our formulations utilize high-purity cerium oxide (CeO₂) as the primary abrasive, leveraging its unique chemical-mechanical polishing (CMP) properties to deliver exceptional surface finishes, increased productivity, and minimized subsurface damage.
Key Benefits
Finishes: Consistently achieve angstrom-level surface roughness crucial for minimizing light scatter and maximizing performance in high-power laser systems.
Optimized for Laser Materials: Formulations are specifically tailored for a wide range of optical substrates.
Rapid Material Removal: Engineered for high stock removal rates, significantly increasing your polishing throughput and reducing processing times without compromising surface quality.
High Stability & Easy Use: Our slurries feature superior suspension characteristics, ensuring uniform particle dispersion, minimal settling, and easy cleanup with water after use.
Custom Formulations: We collaborate closely with your team to develop a bespoke solution that precisely matches your specific application requirements, pad materials, and equipment type.
Tech Data
| Molecular Formula | CAS No. | CeO₂ % | D50 (μm) | Appearance | Application |
| CeO2 | 1306-38-3 | 73~78% | 0.6-0.8 | Slurry | Optics |
Particle Size Distribution
Q&A
1. Do you provide customized Polishing Slurry formulations?
Yes, we offer customized polishing powders and slurries tailored to meet specific performance requirements. Whether you need adjustments to particle size, chemical composition, or slurry consistency, we can create a formulation that best suits your needs.
2. Can I get a sample before making a bulk order?
Yes, we provide samples of our cerium oxide polishing powder and slurry for evaluation. Please contact us to request a sample, and our team will arrange the shipment.
3. How can I place an order? What is the typical delivery time for Polishing Slurry products?
You can place an order by contacting our sales team. We will guide you through the process, help with product selection, and provide you with a quote based on your needs. We’ll provide an estimated delivery schedule once the order is confirmed. Delivery times depend on the order size, location, and whether the product is in stock.
Product Highlights
Customized Polishing Slurry for Laser Optics Description Achieve pristine, defect-free optical surfaces with our advanced, customized cerium-based polishing slurries, specifically engineered for the demanding requirements of high-performance laser optics. Our formulations utilize high-purity cerium ...
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics
Ultra-Fine Ceria Oxide Polishing Powder For Smart Wearable Cover Glass & Micro-Optics Finishing
Ultra-Fine Ceria Oxide Polishing Powder For Smart Wearable Cover Glass & Micro-Optics Finishing Product Overview Developed for high-volume wearable electronics production, this ultra-fine cerium oxide polishing powder enables superior finishing of smartwatch cover glass, AR headset lenses, camera windows, and micro-optical assemblies. The formulation balances chemical activity and mechanical abrasion to deliver mirror-grade surfaces while maintaining high throughput in
High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing
High Purity Cerium Oxide Polishing Powder For AR Waveguide Glass & Optical Lens Manufacturing Product Overview This high-purity ceria polishing powder is specially engineered for ultra-precision polishing of AR waveguide optics, smart glasses lenses, and advanced wearable optical modules. Designed for next-generation augmented reality manufacturing, the product delivers controlled chemical-mechanical polishing (CMP) performance, achieving exceptional surface flatness and
Cerium Oxalate Powder Chemical Reagent Elements
Cerium oxalate is an oxalate salt of trivalent cerium and an important rare earth compound, often existing in the form of hydrate. 1. Basic Information English Name: Cerium(III) oxalate, Cerous oxalate Chemical Formula: (usually hydrate, where x is mostly 9 or 10) Molecular Weight (Anhydrous): 544.29 : Anhydrous: 139-42-4 Hydrate: 15750-47-7 2. Physical and Chemical Properties Appearance: White or pale yellow crystalline powder, odorless and tasteless. Solubility: Practically
Please use our online inquiry contact form below if you have any questions, our team will get back to you as soon as possible.
