120 Results For

"powder rare earth material"

Qualité Poudre de polissage à l'oxyde de cérium ultra-fin pour la finition des semi-conducteurs et des optiques de précision Usine

Poudre de polissage à l'oxyde de cérium ultra-fin pour la finition des semi-conducteurs et des optiques de précision

Ultra-Fine Cerium Oxide Polishing Powder For Semiconductor And Precision Optics Finishing Product Overview Designed for advanced semiconductor and ultra-precision optical finishing, this ultra-fine ceria polishing powder provides exceptional surface planarization and defect minimization. The optimized particle engineering supports next-generation polishing requirements in high-accuracy optical and wafer processing environments. Suitable for high-end semiconductor, aerospace

Qualité Revêtement par pulvérisation d'oxyde d'yttrium pour équipement de semi-conducteurs | Matériau de revêtement résistant au plasma Y₂O₃ de haute pureté Usine

Revêtement par pulvérisation d'oxyde d'yttrium pour équipement de semi-conducteurs | Matériau de revêtement résistant au plasma Y₂O₃ de haute pureté

Yttrium Oxide Spray Coating for Semiconductor Equipment | High-Purity Y₂O₃ Plasma Resistant Coating Material Descripti on Yttrium Oxide (Y₂O₃) Spray Coating Material is a high-purity rare earth ceramic powder engineered for protective coatings used in semiconductor manufacturing equipment. The material is widely applied through thermal spray, plasma spray, or suspension spray coating technologies to protect critical components exposed to aggressive plasma environments.

Qualité Poudre de polissage à l'oxyde de cérium de qualité semi-conducteur pour wafer et substrats avancés Usine

Poudre de polissage à l'oxyde de cérium de qualité semi-conducteur pour wafer et substrats avancés

Semiconductor Grade Cerium Oxide Polishing Powder for Wafer & Advanced Substrates Product Overview Semiconductor Grade Cerium Oxide Polishing Powder is formulated for defect-sensitive polishing applications in semiconductor and advanced electronic substrate manufacturing. The controlled purity and particle engineering reduce contamination risks while ensuring consistent planarization performance. Optimized for preparation of CMP slurries used in semiconductor wafer processing

Qualité Poudre de polissage à l'oxyde de cérium de haute pureté pour composants optiques de précision Usine

Poudre de polissage à l'oxyde de cérium de haute pureté pour composants optiques de précision

High-Purity Cerium Oxide Polishing Powder for Precision Optical Components Product Overview High-Purity Cerium Oxide Polishing Powder is engineered for ultra-precision surface finishing of advanced optical components. Designed for high surface quality requirements, this polishing agent delivers excellent chemical-mechanical interaction, enabling superior defect control, high polishing efficiency, and stable performance in demanding optical manufacturing environments. The

Qualité Poudre de polissage de céréa ultra-fin pour les applications de cristal laser et de photonique Usine

Poudre de polissage de céréa ultra-fin pour les applications de cristal laser et de photonique

Ultra-Fine Ceria Polishing Powder for Laser Crystal and Photonics Applications Product Overview Ultra-Fine Ceria Polishing Powder is developed for polishing laser crystals and advanced photonic materials requiring ultra-low subsurface damage and exceptional surface smoothness. The formulation balances mechanical abrasion and chemical reactivity to achieve controlled polishing with minimized micro-scratches. It is ideal for high-value optical substrates used in laser and

Qualité Polissage du verre automobile en poudre d'oxyde de cérium Usine

Polissage du verre automobile en poudre d'oxyde de cérium

Automotive Glass Polishing Cerium Oxide Powder Product Overview Automotive Glass Polishing Series cerium oxide polishing powder is specially engineered for high-efficiency polishing of automotive glass surfaces, including windshields, side windows, rear glass panels, and panoramic sunroofs. The product delivers fast material removal while achieving excellent surface clarity, scratch elimination, and optical transparency required by modern automotive manufacturing standards.

Qualité Matériau de polissage à faible défectuosité à l'oxyde de cérium pour la fabrication avancée de TFT-LCD Usine

Matériau de polissage à faible défectuosité à l'oxyde de cérium pour la fabrication avancée de TFT-LCD

Low-Defect Cerium Oxide Polishing Material for Advanced TFT-LCD Manufacturing Product Overview Specially engineered cerium oxide polishing material designed for next-generation TFT-LCD manufacturing, focusing on ultra-low defect rates and high throughput production efficiency. Key Features Ultra-low scratch and haze performance High polishing efficiency for mass production Strong chemical stability in slurry systems Optimized for high-yield display manufacturing Consistent

Qualité Additif fonctionnel à l'oxyde de cérium pour les matériaux céramiques et électroniques avancés Usine

Additif fonctionnel à l'oxyde de cérium pour les matériaux céramiques et électroniques avancés

Cerium Oxide Functional Additive for Advanced Ceramic and Electronic Materials Product Overview Cerium Oxide is an important functional additive used in advanced ceramics, electronic components, ferrite materials, sensors, and dielectric applications. It contributes to grain refinement, sintering optimization, and enhanced electrical performance, supporting the production of high-value industrial products. Key Features Promotes controlled grain growth Improves sintering

Qualité Catalyseur d'oxyde de cérium pour les convertisseurs catalytiques automobiles. Usine

Catalyseur d'oxyde de cérium pour les convertisseurs catalytiques automobiles.

Cerium Oxide Catalyst For Automotive Catalytic Converters | High-Purity CeO₂ Oxygen Storage Material Description High-purity cerium oxide used as an oxygen storage catalyst material in automotive catalytic converters. Enhances emission control efficiency, thermal stability, and catalyst durability. Key Features High Oxygen Storage Capacity Cerium oxide efficiently stores and releases oxygen, maintaining optimal catalytic activity under dynamic engine conditions. Enhanced

Qualité Poudre de polissage d'oxyde de cérium pour la fabrication optique avancée. Matériau de polissage optique de haute précision. Usine

Poudre de polissage d'oxyde de cérium pour la fabrication optique avancée. Matériau de polissage optique de haute précision.

Cerium Oxide Polishing Powder For Advanced Optical Manufacturing | High-Precision Optical Polishing Material Descripti on High-performance cerium oxide polishing powder designed for advanced optical manufacturing. Achieve ultra-smooth surfaces, high optical clarity, and superior polishing efficiency for precision optical components. Key Features & Advantages Ultra-Precision Optical Surface Finishing Achieves extremely low surface roughness required for high-end optical

Qualité Oxalate de lanthane de haute qualité. Usine

Oxalate de lanthane de haute qualité.

Lanthanum(III) Oxalate Lanthanum(III) oxalate is an oxalate salt of trivalent lanthanum and an important rare earth compound, which generally exists in the form of hydrate. 1. Basic Information Chinese Name: Lanthanum Oxalate English Name: Lanthanum(III) oxalate Chemical Formula: (decahydrate is common) Molecular Weight (Anhydrous): 541.88 CAS No.: Anhydrous: 537-03-1 Hydrate: 10344-18-0 2. Physical and Chemical Properties Appearance: White crystal or crystalline powder

Qualité Prix compétitif Carbonate de lanthane et de cérium en grande taille Usine

Prix compétitif Carbonate de lanthane et de cérium en grande taille

Large particle size Lanthanum Cerium Carbonate Molecular Formula: (LaCe)₂(CO₃)₃ Appearance: Coarse particle lanthanum cerium carbonate is a white powder Application: Used for the production of rare earth polishing powder. Item Specification Testing Standard Item (LaCe) 2 (CO 3 ) 3 -65CeB1 (LaCe) 2 (CO 3 ) 3 -65CeB2 TREO(wt%) ≥45.0 ≥45.0 Lanthanum-Cerium Distribution and Rare Earth Impurities (wt%) La 2 O 3 /TREO 35±2 35±2 GB/T 18115.1 CeO 2 /TREO 65±2 65±2 Pr 6 O 11 /TREO ≤0