165 Results For

"powder rare earth material"

品質 2.2μM Ph 中性ポリシング CMP グラス・ウェーファー基板用スラム 工場

2.2μM Ph 中性ポリシング CMP グラス・ウェーファー基板用スラム

CMP Slurry For Glass Wafer Substrates Description Lichen CMP Slurry for Glass Wafer Substrates is a high-purity, ready-to-use polishing slurry formulated for precision chemical-mechanical planarization (CMP) of glass wafer substrates. Designed for the advanced semiconductor, photonics, and microelectronics industries, this slurry ensures optimal material removal, uniform surface polishing, and low defect density, meeting the strict requirements for high-performance glass

品質 液体スーパーセリウムオキシド グラス・ポーリング用 水性スラージー・ハズ・リムーバー 工場

液体スーパーセリウムオキシド グラス・ポーリング用 水性スラージー・ハズ・リムーバー

Cerium Oxide Slurry For Display Cover Glass Description Lichen Cerium Oxide Slurry for Display Cover Glass is a high-purity, water-based slurry formulated for the precision polishing of display cover glass. Specifically designed for use in the manufacturing of smartphone screens, tablet covers, and other consumer electronics with glass touch surfaces, our cerium oxide slurry ensures excellent surface quality, enhanced optical clarity, and high durability. This slurry

品質 擦り傷抵抗性 ガラス磨き用セリウム酸化物スラム 0.6μM 工場

擦り傷抵抗性 ガラス磨き用セリウム酸化物スラム 0.6μM

Cerium Oxide Slurry For Display Cover Glass Description Lichen Cerium Oxide Slurry for Display Cover Glass is a high-purity, water-based slurry designed for the precision polishing of display cover glass used in smartphones, tablets, wearables, and other consumer electronics. Formulated with ultra-fine cerium oxide particles, this slurry ensures superior surface smoothness, optical clarity, and scratch resistance, providing a premium finish for high-end glass covers. Perfect

品質 PH 中性セリウムオキシド 自動車ディスプレイガラス用岩石ポリッシュスラム 工場

PH 中性セリウムオキシド 自動車ディスプレイガラス用岩石ポリッシュスラム

Slurry For Polishing Of In-car Display Glass Description Lichen Slurry for Polishing In-Car Display Glass is a high-purity cerium oxide-based slurry designed specifically for the demanding requirements of automotive display glass polishing. This slurry is formulated to deliver superior surface smoothness, high optical clarity, and scratch-free finishes on the glass surfaces used in in-car displays, touchscreens, and instrument clusters. Ideal for automotive infotainment

品質 紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング 工場

紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

品質 水ベースのCeO2 化学機械的な磨きスラム ガラスの欠陥除去 工場

水ベースのCeO2 化学機械的な磨きスラム ガラスの欠陥除去

Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration

品質 半導体向け高純度ナノセリアCMPスラリー(粒子径200nm) 工場

半導体向け高純度ナノセリアCMPスラリー(粒子径200nm)

High-purity Nano Ceria CMP Slurry (200nm Particle Size) Designed For Semiconductor Descripti on High-purity nano ceria CMP slurry (100nm particle size) designed for semiconductor and advanced surface finishing. Stable dispersion, high removal rate, and ultra-low surface defects. It is ideal for next-generation precision polishing processes demanding nanometer-level surface control. Key Features & Advantages Nano-Scale Precision Polishing The 100 nm ceria particles enable

品質 ナノセリアCMPスラージュ 超細かいセリアオキシドスラージュ 高精度半導体と光学磨き用 工場

ナノセリアCMPスラージュ 超細かいセリアオキシドスラージュ 高精度半導体と光学磨き用

Nano Ceria CMP Slurry | Ultra-Fine Cerium Oxide Slurry For High-Precision Semiconductor & Optical Polishing Descripti on Nano Ceria CMP Slurry is a high-purity cerium oxide polishing slurry specifically developed for advanced Chemical Mechanical Planarization (CMP) applications requiring precise material removal and superior surface quality. Formulated with uniformly dispersed nano-scale ceria particles, the slurry delivers an optimal balance between chemical activity and

品質 高性能セリウムオキシドスラム 展示表面磨き用 CAS 1306-38-3 工場

高性能セリウムオキシドスラム 展示表面磨き用 CAS 1306-38-3

High-Performance Cerium Slurry for Display Surface Finishing Description Achieve uncompromising optical clarity with our Precision-Engineered Cerium Oxide (CeO₂) Slurries. Specifically formulated for the display market, our slurries provide the nanometer-level flatness and defect-free surfaces essential for high-resolution LCD, OLED, and MicroLED consumer electronics. By combining high-purity rare earth oxides with advanced chemical stabilizers, our product line ensures

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