"semiconductor slurry"
反射防止太陽ガラス セリウムオキシド 磨き粉 材料 CAS 1306-38-3
Cerium Oxide For Finishing Anti-reflective Solar Glass Description Lichen Cerium Oxide for Finishing Anti-Reflective Solar Glass is an advanced cerium oxide-based polishing powder formulated to provide the smooth, clear, and defect-free finishes required for solar glass with anti-reflective coatings. Designed for solar panel glass polishing, this high-purity polishing powder enhances the optical performance of photovoltaic systems, ensuring optimal light transmission and
スクラッチ削減ガラスポリシングパスタ 3ミクロンセリウム酸化物ベースの粉末
Scratch-reduction Polishing Powder For Smartphone Cover GlassDescriptionLichen Scratch-Reduction Polishing Powder for Smartphone Cover Glass is a high-performance cerium oxide-based powder designed to deliver smooth, scratch-free finishes on smartphone cover glass. Whether you're working with sapphire glass, or other advanced smartphone glass materials, this polishing powder is specially formulated to enhance the optical clarity and durability of mobile device screens, while
光学ガラス加工用高除去率セリウム酸化物研磨粉
High Removal Rate Cerium Oxide Polishing Powder for Optical Glass Processing Product Overview High Removal Rate Cerium Oxide Polishing Powder is engineered for efficient polishing of optical glass components requiring fast material removal and stable surface quality. The optimized particle morphology provides excellent chemical-mechanical interaction with glass substrates, enabling improved productivity without compromising surface finish. Designed for large-scale precision
セリウム酸化ガラス 光学磨き化合物粉末
High Purity Cerium Oxide for Optics Polishing Description: Achieve flawless finishes with our premium Cerium Oxide Polishing Powder/Slurry, specifically engineered for semiconductor, optical component and precision applications. Designed to deliver excellent clarity and smoothness, it’s the perfect choice for polishing delicate surfaces like glass, lenses, and semiconductor wafers. Key Features: Ultra-fine Particles for precision polishing High Purity for optimal performance
AR光学、マイクロレンズアレイ、ウェアラブル光学センサー用CMPグレードセリア研磨剤
CMP-Grade Ceria Polishing Powder For AR Optics, Micro-Lens Arrays & Wearable Optical Sensors Product Overview This CMP-grade ceria polishing powder is engineered for next-generation micro-optical components used in AR wearables, optical sensors, and miniaturized imaging systems. Featuring controlled reactivity and ultra-fine particle engineering, the product enables atomic-level surface finishing required for high-resolution optical performance and advanced photonics
レーザー結晶・精密光学機器用超微細酸化セリウム研磨剤
Ultra-Fine Cerium Oxide Polishing Powder for Laser Crystals & Precision Optics Product Overview Ultra-Fine Cerium Oxide Polishing Powder is developed for ultra-precision polishing processes requiring superior surface finish and minimal subsurface damage. The refined particle distribution enables smooth finishing of laser crystals and advanced optical materials used in high-performance photonics systems. Ideal for final polishing stages demanding nanometer-level surface
