111 Results For

"high purity cerium powder"

品質 セリウムIII 塩化物 稀土物質 CeCl3 無水性粉末 電池用 工場

セリウムIII 塩化物 稀土物質 CeCl3 無水性粉末 電池用

Anhydrous Cerium Chloride Molecular Formula: CeCl₃ Appearance: White powdery crystals Uses: Used in the production of metallic cerium and petroleum catalysts, as a raw material for hydrogen storage battery materials, and in the field of single crystal growth. Item Specifications Test Method Item CeCl3-3N5B CeCl3-4NB CeCl3-4N5B CeCl3-5NB TREO(wt%) ≥68 ≥68 ≥68 ≥68 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99

品質 化学 機械 セリウムオキシド 磨き スラム 光ファイバー用 粉末ガラス 工場

化学 機械 セリウムオキシド 磨き スラム 光ファイバー用 粉末ガラス

Polishing Slurry for Optical Fiber Manufacturing Description Cerium-based polishing slurries are an industry standard in optical fiber manufacturing for achieving the required ultra-smooth, low-defect end-face finishes on fiber optic connectors. They work through a chemical-mechanical action to ensure minimal signal loss and low back reflection in high-speed communication systems. Product Overview Cerium oxide slurries are aqueous suspensions of high-purity, micron or sub

品質 紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング 工場

紫外線保護金属 CMP セリウムオキシドスラム プレコーティング ガラスポーリング

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

品質 ISO9001 ポリシング セリウムオキシド 電子半導体ガラス用稀土ポリシングスラー 工場

ISO9001 ポリシング セリウムオキシド 電子半導体ガラス用稀土ポリシングスラー

High Purity Polishing Slurry For OLED Displays Description Lichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability. Our slurry is ideal for polishing the glass substrates and fine

品質 ODM セリウムオキシド 光伏のカバーガラスのための稀土の磨きスラム 工場

ODM セリウムオキシド 光伏のカバーガラスのための稀土の磨きスラム

Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards

品質 シリコン・ウェーバーのための3ミクロン製のグラス・ポーリング・ペスト粉末 工場

シリコン・ウェーバーのための3ミクロン製のグラス・ポーリング・ペスト粉末

Tailored Polishing Powder For Silicon Wafer Manufacturing Description Lichen Tailored Polishing Powder for Silicon Wafer Manufacturing is a premium cerium oxide-based powder formulated to deliver exceptional performance in the polishing of silicon wafers used in semiconductor manufacturing. Designed to meet the stringent requirements of the semiconductor industry, this powder offers unparalleled control over the material removal rate, surface flatness, and defect reduction,

品質 半導体 ポリシング Ceo2 オキシド スラム 高精度 1.0μm 工場

半導体 ポリシング Ceo2 オキシド スラム 高精度 1.0μm

Polishing Slurry for High-Precision Semiconductor Manufacturing Overview: Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in wafer surface finishing, ensuring ultra-smooth surfaces essential for next-generation semiconductor devices. Key Features: High Purity Cerium Oxide: Utilizes advanced cerium oxide

品質 酸ウチウム稀土化合物 粉末溶液 工場

酸ウチウム稀土化合物 粉末溶液

Oxide Yttrium Rare Earth Compound Powder Overview: Our custom yttrium-based rare earth compound powders are engineered to meet the stringent quality, purity, and consistency requirements of pharmaceutical research and manufacturing. Leveraging advanced synthesis and purification technologies, we provide tailor-made powder solutions designed for specific formulation, processing, and regulatory needs. We work closely with pharmaceutical partners to customize chemical compositio

品質 工業用ラッピング 希少土の磨きスラム 結晶ガラス磨き用 工場

工業用ラッピング 希少土の磨きスラム 結晶ガラス磨き用

Industrial Abrasives For Crystal Glass Polishing Description Lichen Industrial Abrasives for Crystal Glass Polishing are specially formulated cerium oxide-based abrasives designed for high-precision polishing of crystal glass surfaces. Whether polishing fine crystal glassware, decorative glass, or optical crystal, our abrasives ensure a flawless, high-clarity finish that meets the highest standards of optical quality and aesthetic appeal. Lichen's abrasives are formulated to

品質 水ベースのCeO2 化学機械的な磨きスラム ガラスの欠陥除去 工場

水ベースのCeO2 化学機械的な磨きスラム ガラスの欠陥除去

Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration

品質 CMP 希少土の磨きスラム 化学 機械式平面化 スラム 半導体ウェーファー用 工場

CMP 希少土の磨きスラム 化学 機械式平面化 スラム 半導体ウェーファー用

Custom CMP Polishing Slurry for Semiconductor Wafer Overview: Our Custom CMP Polishing Slurry is specifically designed to meet the high-precision demands of semiconductor wafer polishing. Utilizing advanced cerium oxide technology, this slurry provides superior performance in Chemical Mechanical Planarization (CMP) applications, offering a customized solution for a variety of semiconductor materials. Key Features: Tailored Formulation: Customizable slurry composition for

品質 2.2μM Ph 中性ポリシング CMP グラス・ウェーファー基板用スラム 工場

2.2μM Ph 中性ポリシング CMP グラス・ウェーファー基板用スラム

CMP Slurry For Glass Wafer Substrates Description Lichen CMP Slurry for Glass Wafer Substrates is a high-purity, ready-to-use polishing slurry formulated for precision chemical-mechanical planarization (CMP) of glass wafer substrates. Designed for the advanced semiconductor, photonics, and microelectronics industries, this slurry ensures optimal material removal, uniform surface polishing, and low defect density, meeting the strict requirements for high-performance glass