111 Results For

"high purity cerium powder"

품질 세리움 III 염화물 희토류 CeCl3 비수 분말 배터리용 공장

세리움 III 염화물 희토류 CeCl3 비수 분말 배터리용

Anhydrous Cerium Chloride Molecular Formula: CeCl₃ Appearance: White powdery crystals Uses: Used in the production of metallic cerium and petroleum catalysts, as a raw material for hydrogen storage battery materials, and in the field of single crystal growth. Item Specifications Test Method Item CeCl3-3N5B CeCl3-4NB CeCl3-4N5B CeCl3-5NB TREO(wt%) ≥68 ≥68 ≥68 ≥68 Rare Earth Relative Purity (wt%) La2O3/TREO ≤0.01 ≤0.005 ≤0.003 ≤0.0004 GB/T 18115.2 CeO2/TREO ≥99.95 ≥99.99 ≥99

품질 화학적 기계적 세리움 산화물 닦기 유연 가루 유리 광섬유 공장

화학적 기계적 세리움 산화물 닦기 유연 가루 유리 광섬유

Polishing Slurry for Optical Fiber Manufacturing Description Cerium-based polishing slurries are an industry standard in optical fiber manufacturing for achieving the required ultra-smooth, low-defect end-face finishes on fiber optic connectors. They work through a chemical-mechanical action to ensure minimal signal loss and low back reflection in high-speed communication systems. Product Overview Cerium oxide slurries are aqueous suspensions of high-purity, micron or sub

품질 자외선 보호 금속 CMP 시리움 산화물 슬러리 공장

자외선 보호 금속 CMP 시리움 산화물 슬러리

Cerium Oxide Slurry For Pre-coating Glass Polishing Description Lichen Cerium Oxide Slurry for Pre-Coating Glass Polishing is a high-performance, cerium oxide-based slurry designed specifically for pre-coating glass polishing. Ideal for use in the glass manufacturing and coating industries, this slurry ensures a smooth, defect-free surface that is essential for optimal adhesion and uniformity of glass coatings. Whether you are working with automotive glass, architectural

품질 ISO9001 세리움 산화물 닦기 전자 반도체 유리용 희토류 닦기 슬러리 공장

ISO9001 세리움 산화물 닦기 전자 반도체 유리용 희토류 닦기 슬러리

High Purity Polishing Slurry For OLED Displays Description Lichen High-Purity Polishing Slurry for OLED Displays is an advanced cerium oxide-based slurry designed to meet the demanding requirements of OLED display production. Engineered for ultra-smooth finishes, our slurry provides exceptional surface quality, critical for OLED panels, ensuring high optical performance, color accuracy, and long-term reliability. Our slurry is ideal for polishing the glass substrates and fine

품질 ODM 세리움 산화물 희토류 닦기 슬러리 광전기 덮개 유리 공장

ODM 세리움 산화물 희토류 닦기 슬러리 광전기 덮개 유리

Polishing Slurry For Photovoltaic Cover Glass Description Lichen Polishing Slurry for Photovoltaic Cover Glass is a high-performance cerium oxide-based slurry designed specifically for the polishing and finishing of solar panel cover glass. Engineered to meet the demanding requirements of the solar energy industry, this slurry delivers superior surface quality, enhanced light transmission, and improved durability, ensuring your photovoltaic glass meets the highest standards

품질 실리콘 웨이퍼를 위한 맞춤형 유리 닦기 페이스트 파우더 3 미크론 공장

실리콘 웨이퍼를 위한 맞춤형 유리 닦기 페이스트 파우더 3 미크론

Tailored Polishing Powder For Silicon Wafer Manufacturing Description Lichen Tailored Polishing Powder for Silicon Wafer Manufacturing is a premium cerium oxide-based powder formulated to deliver exceptional performance in the polishing of silicon wafers used in semiconductor manufacturing. Designed to meet the stringent requirements of the semiconductor industry, this powder offers unparalleled control over the material removal rate, surface flatness, and defect reduction,

품질 반도체 닦는 Ceo2 산화물 슬러리 고정도 1.0μm 공장

반도체 닦는 Ceo2 산화물 슬러리 고정도 1.0μm

Polishing Slurry for High-Precision Semiconductor Manufacturing Overview: Our high-performance Polishing Slurry for Semiconductor Manufacturing is engineered to meet the demanding needs of the semiconductor industry. Specially formulated with cerium oxide, this slurry offers superior precision in wafer surface finishing, ensuring ultra-smooth surfaces essential for next-generation semiconductor devices. Key Features: High Purity Cerium Oxide: Utilizes advanced cerium oxide

품질 氧化钇稀土化合物粉末解决方案 공장

氧化钇稀土化合物粉末解决方案

Oxide Yttrium Rare Earth Compound Powder Overview: Our custom yttrium-based rare earth compound powders are engineered to meet the stringent quality, purity, and consistency requirements of pharmaceutical research and manufacturing. Leveraging advanced synthesis and purification technologies, we provide tailor-made powder solutions designed for specific formulation, processing, and regulatory needs. We work closely with pharmaceutical partners to customize chemical compositio

품질 산업용 랩링 희토류 가루 가루 크리스탈 유리 가루 가루 공장

산업용 랩링 희토류 가루 가루 크리스탈 유리 가루 가루

Industrial Abrasives For Crystal Glass Polishing Description Lichen Industrial Abrasives for Crystal Glass Polishing are specially formulated cerium oxide-based abrasives designed for high-precision polishing of crystal glass surfaces. Whether polishing fine crystal glassware, decorative glass, or optical crystal, our abrasives ensure a flawless, high-clarity finish that meets the highest standards of optical quality and aesthetic appeal. Lichen's abrasives are formulated to

품질 물 기반의 CeO2 화학적 기계적 닦기 슬러리 유리 결함 제거 공장

물 기반의 CeO2 화학적 기계적 닦기 슬러리 유리 결함 제거

Polishing Slurry For Float Glass Surface Defect RemovalDescriptionLichen Polishing Slurry for Float Glass Surface Defect Removal is a cerium oxide-based slurry specifically formulated to effectively remove surface defects from float glass. Whether addressing scratches, water spots, haze, or micro-defects, our slurry delivers superior material removal rates and enhances surface clarity, making it ideal for both manufacturing and post-production glass surface restoration

품질 CMP 희토류 닦는 슬러리 화학 기계 평형화 슬러리 반도체 웨이퍼 공장

CMP 희토류 닦는 슬러리 화학 기계 평형화 슬러리 반도체 웨이퍼

Custom CMP Polishing Slurry for Semiconductor Wafer Overview: Our Custom CMP Polishing Slurry is specifically designed to meet the high-precision demands of semiconductor wafer polishing. Utilizing advanced cerium oxide technology, this slurry provides superior performance in Chemical Mechanical Planarization (CMP) applications, offering a customized solution for a variety of semiconductor materials. Key Features: Tailored Formulation: Customizable slurry composition for

품질 2.2μM Ph 중립 닦기 CMP 유리 웨이퍼 기판용 슬러리 공장

2.2μM Ph 중립 닦기 CMP 유리 웨이퍼 기판용 슬러리

CMP Slurry For Glass Wafer Substrates Description Lichen CMP Slurry for Glass Wafer Substrates is a high-purity, ready-to-use polishing slurry formulated for precision chemical-mechanical planarization (CMP) of glass wafer substrates. Designed for the advanced semiconductor, photonics, and microelectronics industries, this slurry ensures optimal material removal, uniform surface polishing, and low defect density, meeting the strict requirements for high-performance glass