Calidad Alumina CMP Slurry | Aluminum Oxide Slurry For Chemical Mechanical Planarization Fábrica
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Calidad Alumina CMP Slurry | Aluminum Oxide Slurry For Chemical Mechanical Planarization Fábrica
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Alumina CMP Slurry | Aluminum Oxide Slurry For Chemical Mechanical Planarization

Nombre de la marca: LICHEN
Número de modelo: LC
Lugar de origen: Porcelana
Certificación: ISO9001
Cantidad mínima de pedido: 20KGS
Precio: Contact us
Capacidad de suministro: 3000MT/year

Detalles del producto


D50: 80 – 250 nm pH: ajustable
contenido sólido: 5 – 20% en peso Distribución de partículas: PSD estrecho
Estabilidad de dispersión: Excelente Rendimiento desde cero: Bajo
Resaltar

alumina CMP slurry for planarization

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aluminum oxide slurry chemical mechanical

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CMP slurry with aluminum oxide

Descripción de producto

Alumina CMP Slurry | Aluminum Oxide Slurry For Chemical Mechanical Planarization

Overview:

Alumina CMP Slurry is a semiconductor-grade polishing material developed for high-precision chemical mechanical planarization (CMP) processes used in integrated circuit manufacturing and advanced electronic materials processing.

The slurry combines finely engineered aluminum oxide abrasive particles with optimized chemical formulations to achieve uniform material removal and superior wafer surface planarization. Its controlled mechanical action enables efficient polishing while maintaining low defect density and excellent surface integrity.

Engineered for compatibility with modern CMP equipment, the slurry supports stable operation in high-volume semiconductor production environments and delivers consistent performance across extended polishing cycles.

 

Key Features & Advantages

Precision Wafer Planarization

Provides excellent global and local planarization performance required for multilayer semiconductor structures.

Stable Material Removal Rate

Ensures predictable polishing behavior across different wafer batches and production cycles.

Low Defect & Scratch Control

Advanced dispersion technology minimizes particle agglomeration and reduces micro-scratch formation.

High Process Reliability

Designed for continuous semiconductor manufacturing with minimal process variation.


Particle Size Distribution

Alumina CMP Slurry | Aluminum Oxide Slurry For Chemical Mechanical Planarization 0

Typical Applications

Semiconductor Manufacturing

  • Silicon wafer CMP
  • Oxide layer planarization
  • Metal layer polishing
  • Interlayer dielectric polishing

Manufacturing & Quality Assurance

Produced using advanced slurry manufacturing technology:

  • High-purity alumina
  • Nano-scale dispersion engineering
  • Strict semiconductor-grade quality control

Why Choose Our Alumina CMP Slurry

Dedicated CMP material manufacturer

  • Semiconductor process understanding
  • Custom slurry development capability
  • Stable international supply chain
  • Technical application support


Q&A

1. Can I get a sample before making a bulk order?

Absolutely! We provide samples for evaluation. Contact our team to request a sample, and we’ll arrange the shipment.

2. How can I place an order? What is the typical delivery time?

To place an order, simply contact our sales team, who will guide you through the process and provide a quote. Delivery times vary based on order size, location, and stock availability, and we’ll give you an estimated schedule once the order is confirmed.

Lo más destacado del producto

Alumina CMP Slurry | Aluminum Oxide Slurry For Chemical Mechanical Planarization Overview: Alumina CMP Slurry is a semiconductor-grade polishing material developed for high-precision chemical mechanical planarization (CMP) processes used in integrated circuit manufacturing and advanced electronic ...

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