High Purity Ultra Fine Polishing Oxide Cerium Powder 99.999%
Dettagli del prodotto
| applicazione: | vetro ottico, materiale cristallino | Utilizzo: | ceramica, vetro, fosfori |
|---|---|---|---|
| Parole chiave: | Polvere di lucidatura dell'ossido del cerio | Peso Molecolare: | 392.24 G/mol |
| Densità: | 4,5-7,0 g/cm³ (a seconda dell'ossido specifico) | Tasso UV di isolamento: | UVB>90% UVA>60% |
| Applicazioni: | Catalizzatori, magneti, fosfori, ceramiche | CAS: | 13709-42-7 |
| Campione: | Disponibile | Purezza: | 99,9% o superiore |
| Imballaggio: | 50 kg/tamburo | Formula: | Y2O3 |
| Solubilità in acqua: | Insolubile in acqua, moderatamente | Colore: | Da bianco a biancastro |
| Formula chimica: | Ittrio | ||
| Evidenziare |
high purity cerium powder,Ultra Fine cerium powder,Fine cerium oxide for glass polishing |
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Descrizione di prodotto
Ultra-Clean 5N Cerium Oxide for Precision Optical & Semiconductor Polishing
Overview:
Lichen High Purity Ultra-Fine Cerium Oxide Polishing Powder (99.999%) is a premium-grade 5N cerium oxide (CeO₂) engineered for the most demanding precision polishing and surface finishing applications. With ultra-low impurity levels and narrow, ultra-fine particle size distribution, this product delivers exceptional surface smoothness, minimal defect generation, and highly repeatable polishing performance.
It is specifically designed for advanced optics, semiconductor substrates, photonics, and high-value glass components where even trace contamination or surface damage is unacceptable.
Key Features & Advantages
Ultra-High Purity (5N, 99.999%)
Extremely low metallic and ionic impurities reduce contamination risk in sensitive processes.
Ultra-Fine Particle Size Distribution
Enables controlled, gentle material removal with superior surface smoothness.
Low Defect Generation
Minimizes micro-scratches, haze, pits, and subsurface damage.
Excellent Batch Consistency
Ensures stable polishing performance in high-precision manufacturing.
High Chemical–Mechanical Polishing Efficiency
Optimized cerium chemistry enhances polishing selectivity and efficiency on glass and oxide surfaces.
Typical Applications
Precision Optical Polishing
Lenses, prisms, windows, and laser optics.
Semiconductor & Glass Wafer Finishing
Polishing of glass wafers, oxide layers, and specialty substrates.
Photonics & Display Glass
High-clarity surfaces for photonic components and advanced display panels.
Pre-Coating Surface Preparation
Ultra-clean surfaces prior to AR and optical thin-film coatings.
Caratteristiche del prodotto
Ultra-Clean 5N Cerium Oxide for Precision Optical & Semiconductor Polishing Overview: Lichen High Purity Ultra-Fine Cerium Oxide Polishing Powder (99.999%) is a premium-grade 5N cerium oxide (CeO₂) engineered for the most demanding precision polishing and surface finishing applications. With ultra...
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