High Purity Ultra Fine Polishing Oxide Cerium Powder 99.999%
製品詳細
| 応用: | 光学ガラス、結晶性材料 | 使用法: | セラミックス、ガラス、蛍光体 |
|---|---|---|---|
| キーワード: | セリウムの酸化物の磨く粉 | 分子量: | 392.24 G/mol |
| 密度: | 4.5 ～ 7.0 g/cm3 (特定の酸化物によって異なります) | 紫外線分離率: | UVB>90% UVA>60% |
| アプリケーション: | 触媒、磁石、蛍光体、セラミックス | CAS: | 13709-42-7 |
| サンプル: | 利用可能 | 純度: | 99.9%以上 |
| パッキング: | 50kg/太鼓 | 式: | Y2O3 |
| 水への溶解度: | 水に中程度に不溶性 | 色: | 白からオフホワイトまで |
| 化学式: | イットリウム | ||
| ハイライト |
high purity cerium powder,Ultra Fine cerium powder,Fine cerium oxide for glass polishing |
||
製品の説明
Ultra-Clean 5N Cerium Oxide for Precision Optical & Semiconductor Polishing
Overview:
Lichen High Purity Ultra-Fine Cerium Oxide Polishing Powder (99.999%) is a premium-grade 5N cerium oxide (CeO₂) engineered for the most demanding precision polishing and surface finishing applications. With ultra-low impurity levels and narrow, ultra-fine particle size distribution, this product delivers exceptional surface smoothness, minimal defect generation, and highly repeatable polishing performance.
It is specifically designed for advanced optics, semiconductor substrates, photonics, and high-value glass components where even trace contamination or surface damage is unacceptable.
Key Features & Advantages
Ultra-High Purity (5N, 99.999%)
Extremely low metallic and ionic impurities reduce contamination risk in sensitive processes.
Ultra-Fine Particle Size Distribution
Enables controlled, gentle material removal with superior surface smoothness.
Low Defect Generation
Minimizes micro-scratches, haze, pits, and subsurface damage.
Excellent Batch Consistency
Ensures stable polishing performance in high-precision manufacturing.
High Chemical–Mechanical Polishing Efficiency
Optimized cerium chemistry enhances polishing selectivity and efficiency on glass and oxide surfaces.
Typical Applications
Precision Optical Polishing
Lenses, prisms, windows, and laser optics.
Semiconductor & Glass Wafer Finishing
Polishing of glass wafers, oxide layers, and specialty substrates.
Photonics & Display Glass
High-clarity surfaces for photonic components and advanced display panels.
Pre-Coating Surface Preparation
Ultra-clean surfaces prior to AR and optical thin-film coatings.
製品 ハイライト
Ultra-Clean 5N Cerium Oxide for Precision Optical & Semiconductor Polishing Overview: Lichen High Purity Ultra-Fine Cerium Oxide Polishing Powder (99.999%) is a premium-grade 5N cerium oxide (CeO₂) engineered for the most demanding precision polishing and surface finishing applications. With ultra...
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